Transparent Electrode Forming Technology using ESD Coating Methode

ESD 기법을 이용한 투명전도막 형성 기술

  • 김정수 (한국기계연구원 나노융합생산시스템연구본부) ;
  • 김동수 (한국기계연구원 선임연구본부장)
  • Published : 2009.11.25

Abstract

The conductive coating method is used for various industrial fields. For example, Sputtering process is used to coat ITO layer in LCD or OLED panel manufacture process and fabricate a base layer of substrate of an electric printing device. However, conventional coating processes (beam sputtering, spin coating etc.) has a problems in the industrial manufacturing process. These processes have a very high cost and critical manufacturing environment as a vacuum process. Recently, many researchers have proposed various printing process instead of conventional coating processes. In this paper, we propose an ESD printing process in ITO coating layer and apply to fabricate a conductive coating film. Furthermore, the effect of the nozzle and also the applied voltage on different configuration of the nozzle head was also studied for better understanding of the Electro Static deposition process.

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