Fabrication of nano-structured PMMA substrates for the improvement of the optical transmittance

반구형 나노 패턴의 크기에 따른 PMMA기판의 광특성 평가

  • 박용민 (강원대학교 기계메카트로닉스공학과 대학원) ;
  • 신홍규 (강원대학교 기계메카트로닉스공학과 대학원) ;
  • 김병희 (강원대학교 기계메카트로닉스공학과 대학원) ;
  • 서영호 (강원대학교 기계메카트로닉스공학부)
  • Published : 2009.10.08

Abstract

This paper presents fabrication method of nano-structured PMMA substrates as well as evaluations of their optical transmittance. For anti-reflective surface, surface coating method had been conventionally used. However, it requires high cost, complicated process and post-processing times. In this study, we suggested the fabrication method of anti-reflective surface by the hot embossing process. Using the nano patterned master fabricated by anodic aluminum oxidation process. Anodic aluminum oxide(AAO) is widely used as templates or a molds for various applications such as carbon nano tube (CNT), nano rod and nano dots. Anodic aluminum oxidation process provides highly ordered regular nano-structures on the large area, while conventional pattering methods such as E-beam and FIB can fabricate arbitrary nano-structures on small area. We fabricated a porous alumina hole array with various inter-pore distance and pore diameter. In order to replicate nano-structures using alumina nano hole array patterns, we have carried out hot-embossing process with PMMA substrates. Finally the nano-structured PMMA substrates were fabricated and their optical transmittances were measured in order to evaluate the charateristivs of anti-reflection. Anti-reflective structure can be applied to various displays and automobile components.

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