The characterization of low-k SiCOH etched film as a function of plasma power

  • Lee, Sung-Woo (Department of Physics, Brain Korea 21 Physics Research Division, Institute of Basic Science, Sungkyunkwan University) ;
  • Woo, Ji-Hyung (Department of Physics, Brain Korea 21 Physics Research Division, Institute of Basic Science, Sungkyunkwan University) ;
  • Choi, Seung-Chae (Department of Physics, Brain Korea 21 Physics Research Division, Institute of Basic Science, Sungkyunkwan University) ;
  • Jung, Dong-Geun (Department of Physics, Brain Korea 21 Physics Research Division, Institute of Basic Science, Sungkyunkwan University) ;
  • Yang, Jae-Young (Advanced Nano-tech Development Team, Semiconductor Business, Dongbu HiTek co., Ltd.) ;
  • Boo, Jin-Hyo (Department of chemistry, Sungkyunkwan University) ;
  • Cho, Sang-Jin (Department of chemistry, Sungkyunkwan University) ;
  • Chae, Hee-Yeop (Department of Chemical Engineering, Sungkyunkwan University)
  • Published : 2009.02.11