한국전기전자재료학회:학술대회논문집 (Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference)

한국전기전자재료학회 (The Korean Institute of Electrical and Electronic Material Engineers)
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$Cl_2$/Ar 방전에서의 플라즈마 변수에 대한 이온과 라디칼 밀도 의존성 분석

Dependence Analysis of Radical and Ion Densities on Plasma Parameters in $Cl_2$/Ar Discharges

  • 발행 : 2010.06.16
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초록

Dependence of radical and ion densities on Plasma Parameters is theoretically investigated in $Cl_2$/Ar plasma discharges. Firstly, a set of reliable rate coefficients is obtained by direct calculations with cross section data set and by comparing them with previously reported values. Then, some global discharge simulations are performed for ICP(inductively coupled plasma) discharges and the results are compared with experimental results. Finally, the validated data set is used to analyze the dependence of radical and ion densities, which are usually not easy to be measured, on electron density arid temperature.

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