실시간 고속 플라즈마 아킹 검출에 대한 연구

Case Study of High-speed Real-time Plasma Arc Detection

Arc in plasma processing chamber results in high current discharge marks and particles on wafers, but it is hard to identify or observe it during the proc ess. In this paper, we report the observations of plasma arc s during various plasma proc esses through a non-invasive optic al plasma monitoring system (OPMS) devised for the in-situ detec tion of abnormal discharge.