Fabrication of the Photoresist Surface-Relief Phase Holographic Grating and Its Performance Test

포토레지스트 surface-Relief 위상형 홀로그라피 분광회절격자의 제작 및 성능평가

  • 정만호 (한국표준연구소 광학연구소) ;
  • 이인원 (한국표준연구소 광학연구소) ;
  • 이상배 (연세대학교 전자공학과) ;
  • 박민용 (연세대학교 전자공학과)
  • Published : 1987.05.01

Abstract

Holographic diffraction gratings which are the core element of the optical instruments such as a spectrophotometer have been fabricated using the photoresist as a recording material. A 488nm line from an argon laser is used in making the gratings. Transmission type surface-relief phase grating and reflection type which is fabsricated by coating the aluminum on the transmission type with thickness 2000\ulcornerare fabricated, the spatical frequency of which are 1200 lines/mm. Diffraction efficiency, scattered light and wave-front aberratin are measured to test the performance of the developed gratings. A marimum diffraction efficiency is given when light is incident at the Bragg angle. Theoretical efficiency is about 80%, but measured efficiency of the transmission type and reflection type is 50% and 45%, respectively.

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