-Physical Properties of Metal Thin Film-(Changes of Structure with Evaporation Rates)

금속박막의 물리적 성질(I)(증착속도에 따르는 구조변화)

  • 백수현 (한양대학교 재료공학과) ;
  • 조현춘 (한양대학교 재료공학과)
  • Published : 1987.06.01

Abstract

The thin metal films of Cr, Al, Mn and were made in various evaporation rates with 100\ulcornerthickness under 2x10**-9 bar vacuum level. We analized and discussed the relationships between changes of structure, morphology and sheet resistance, light transmittance for the corresponding evaporation rates. As the evaporation rates were decreased at higher rates, grain sizes of all film were decreased, however both of the sheet resistance and light transmittance were increased. At lower evaporation rate, films of Cr and Cu porduced non-stoi-chiometric oxides but Al an Mn showed up amorphous structures.

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