Properties of the Chemically Vapor Deposited Alumina Thin Film and Powder on Heat Treatment

CVD법으로 합성된 알루미나 박막 및 분말의 열처리에 따른 특성

  • 최두진 (한국과학기술원 무기재료연구실) ;
  • 정형진 (한국과학기술원 무기재료연구실)
  • Published : 1989.02.01

Abstract

A study on the APCVD(atmospheric pressure chemical vapor deposition) Al2O3 was done by using the aluminum-tri-isopropoxide/N2 reaction system at 40$0^{\circ}C$. When the flow rate of the carrier gas(N2) was over 2SLPM, heterogeneous reaction was observed. However, when the flow rate of the carrier gas was below 2SLPM, a porously deposited film or powder formation was observed. The film formed by a heterogeneous reaction was optically dense. The dense film is thought to be a kind of a hydrated alumina. After a thermal treatment of the film in the range of temperature from $600^{\circ}C$ to 1, 20$0^{\circ}C$, properties of the film seems to be changed due to dehydration and densification process. In the case of the powder on heat treatment(600~1, 20$0^{\circ}C$), both a phase transformation and the change of OH peak was observed.

Keywords

References

  1. THIN FILM PROCESSES John L. Vossen;Werner kern
  2. J. Electrochem. Soc. v.114 no.9 Deposition and Properties of Aluminum Oxide Obtained by Pyrolytic Decomposition of an Aluminum Alkoxide J.A.Aboaf
  3. J. Mater. Res v.3 no.5 Effects of Annealing on the Structure and Electrical Conductivity of CVD Alumina Films A.S.Wong;G.M.Michal;I.E.Locci;P.W.Cheung
  4. RCA Review Chemical Vapor Deposition of Aluminum Oxide Films from Organo-Aluminum Compounds M.T.Duffy;Werner Kern
  5. J. of Elect. Mater. v.12 no.3 Low Temperature Oxide Deposition Using Trimethylaluminum R.S.Ehle;B.J.Baliga;Katz
  6. Fundamentals of Silicon intergrated Device Technology v.1 R M. Burger;R.P.Donovan
  7. CRC Handbook of Chemistry and Physics v.16 Robert C. Weast; Melvin J. Astle
  8. Elements of Ceramics v.14 F.H.Norton
  9. J. Am. Cer. Soc. v.71 no.10 Thickness Dependence of Fracture Stress in Glass Films Coated on Silicon Masaru Shimbo