Journal of the Korean Ceramic Society (한국세라믹학회지)

The Korean Ceramic Society (한국세라믹학회)
권호 표지

Chemical Vapor Deposition of Diamond Film from Methane-Hydrogen Gas in Microwave Plasma

마이크로웨이브 플라즈마에서 메탄-수소가스로부터 다이아몬드박막의 화학증착

  • 이길용 (포항공과대학 재료금속공학과) ;
  • 제정호 (포항공과대학 재료금속공학과)
  • Published : 1989.03.01
Download PDF
⟨ Previous Next ⟩

Abstract

In this study, it was tried to deposit diamond films from a mixture of CH4 and H2 by the microwave plasma chemical vapor deposition(MWCVD). The MWCVD process was designed and set up from the 2.45GHz microwave generator. And the diamond film was successfully deposited on silicon wafers from the mixture of methane and hydrogen. The microstructures of the deposited diamond films were studied by using the following deposition variables : (a) methane concentration(0.6-10%), (b) reaction pressure(10-100torr), and (c) the substrate temperature(450-76$0^{\circ}C$).

Keywords

References

  1. The New York Times
  2. Apply. Phys. Letters v.29 E.G.Spencer; P.H.Schmidt;D.C.Joy;F.J.Sansalone
  3. US Patents No.3030187 and No.3030188 W.G.Eversole
  4. U.S.Patent No.4,434,188 M.Kamo;S.Matsumoto;Y.Sato;N.Setaka
  5. J.Crystal Growth v.52 B.V.Spitsyn;L.L.Bouilov;B.V.Derjaguin
  6. Growth of Diamond and Graphite from Gas Phases B.V.Derjaguin;D.V.Fedoseev
  7. Sov.Phys.Dokl v.29 V.P.Varnin;I.G.Teremetskaya;D.V.Fedoseev;B.V.Derjaguin
  8. Appl.Phys.Letters v.50 K.Suzuki;A.Sawabe,;H.Yasuda;T.Inuzuka
  9. Fall Meeting of the Japanese Society of Applied Physics, Conf, Proc. Oishi;Kajiakawa;Hayashi;Inoie;Kawate
  10. J.Crystal Growth v.62 M.Kamo;Y.Sato;S.Matsumoto;N.Setaka
  11. J.Mat.Sci. v.17 S.Matsumoto;Y.Sato;M.Tsutsumi
  12. Appl.Phys.Lett. v.49 K.Kitahama(et al.)
  13. Nature v.275 J. H. Freeman;W.Temple;G.A.Gard
  14. Appl.Phys.Letters v.46 A Sawabe;T.Inuzuka
  15. J.Appl.Phys v.59 N.Savvides
  16. 대한금속학회지 v.24 K.Akashi;T.Yoshida;S.Komatsu;Y.Mitsuda
  17. J.Mater.Sci. v.22 Y.Mitsuda,;Y.Kojima,;T.Yoshida,;K.Akashi
  18. Phys,Rev. v.B38 K.Kobashi,;K.Nishimura,;Y.Kawate,;T.Horiuchi
  19. J.Vac.Sci.Technol. v.A6 K.Kobashi,;K.Nishimura,;Y.Kawate,;T.Horiuchi
  20. Proc.8th Int.Conf.Gas Discharges M.Kamo,;Y.Sato,;N.Setaka
  21. J.Vac.Sci.Technol. v.A6 R.J.Nemanich;J.T.Glass;G.Lucovsky;R.E.Shroder
  22. Physical Review B v.38 K.Kobashi,;D.Nishimura,;Y.Kawate,;T.Horiuchi
  23. ISPC-8 Tokyo ; Paper No.S7-01 no.S7-01 Y.Sato;M.Kamo;N.Setaka
  24. J. Mater. Sci. Lett. v.5 Y.Saito;S.Matsuda;S.Nogita
  25. Physica B+C v.105B N.Wada;S.A.Solin
  26. Carbon v.11 B.V.Derjanguin;D.V.Fedoseev
  27. J.Appl.Phys. v.21 S.Matsumoto;Y.Sato;M.Kamo;N.Setaka
  28. J.Mater. Sci. Lett. v.4 S.Matsumoto