Applied Chemistry for Engineering (공업화학)

The Korean Society of Industrial and Engineering Chemistry (한국공업화학회)
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Synthesis and Characterization of Photosensitive Naphthoquinonediazide-sulfonyl Derivatives

나프토 퀴논 디아지드 유도체의 합성 및 그 감광 특성

  • Joo, So-Young (Depart. of Textile Engineering, Seoul National University) ;
  • Hong, Sung-Il (Depart. of Textile Engineering, Seoul National University)
  • 주소영 (서울대학교 공과대학 섬유공학과) ;
  • 홍성일 (서울대학교 공과대학 섬유공학과)
  • Received : 1990.11.22
  • Published : 1990.12.31
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Abstract

Synthesis and characterization of photosensitive orthonaphthoquinonediazide-sulfonyl derivatives were studied. These photoactive compounds underwent a UV induced transformation to the base-soluble photoproduct. The photoresists were prepared using these photoactive compounds with low molecular weight m-cresol novolacs as matrix resin. And photosensitive characteristics of the photoresists were studied. 3, 4, 5-Trihydroxy-benzophenone with bulky resonance structure increased the sensitivity and the solubility rate of the exposed region. The mixture of PAC and matrix resin having 3:8 weight ratio had the moderate rate of dissolution in the developer. The photoresist using these conditions showed the best snsitivity and contrast under the fixed conditions.

감광성 orthonaphthoquinonediazide-sulfonyl 유도체를 합성하고, 그 감광특성에 대해 검토한 결과, UV에 의해 광변환 되어, 알칼리 가용성의 분해화합물이 생성됨을 확인하였다. 이 유도체를 PAC로, m-cresol novolac을 matrix resin으로 photoresist를 제조하고 감광 특성을 고찰하여, 미세 패턴용 photoresist로의 타당성을 확인하였다. 3, 4, 5-Trihydroxybenzophenone 의 벌키한 공명 구조는 노광부의 감도와 가용성을 향상시켰으며, PAC 와 matrix resin의 혼합 무게비가 3:8 일 때 가장 적절한 dissolution rate를 나타냈으므로, 이 photoresist가 정해진 조건 하에서 감도, 해상력이 가장 우수하였다.

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