Hydrothermal Growth of $GaPO_{4}$ Single Crystals in HCI Solution

  • Pan-Chae Kim (Department of Inorganic Materials Engineering, Dongshin University) ;
  • Shin-Ichi Hirano (Department of applied Chemistry, Faculty of Engineering, Nagoya University)
  • Published : 1991.02.01

Abstract

The hydrothermal growth of $GaPO_{4}$ Single Crystals was carried out by the horizontal temperature gradient method. The most promising solvents for the crystal growth of $GaPO_{4}$ are $H_{3}PO_{4}$ and HCl solutions. Single crystals have been hydothermally grown at temperatures over the range $210-290^{\circ}C$ in these solutions with seed crystals. The glowth rates in HCl solution were higher than that for comparable conditions in $H_{3}PO_{4}$ solution. Morphologies of crystals grown at temperatures below $200^{\circ}C$ tended to be bounded by small major rhombohedral(10$\bar{1}$1) faces. In the temperature range from 200 to $430^{\circ}C$, the single crystals have morphologies bounded by prism (10$\bar{1}$0), small major rhombohedral(10$\bar{1}$1) and minor rhombohedral(01$\bar{1}$1) faces at the early stage, and grew with well developed basal(0001) faces by increasing the growth temperature.

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