Journal of the Korean Ceramic Society (한국세라믹학회지)

The Korean Ceramic Society (한국세라믹학회)
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The Fabrication of the $ZrO_2$ Thin Film by Chemical Vapor Deposition and the Effect of the Reaction Parameters on the Deposition Characteristics

화학증착법에 의한 $ZrO_2$ 박막의 제조 및 반응변수에 따른 증착특성

  • 최준후 (한국과학기술원 재료공학과) ;
  • 김호기 (한국과학기술원 재료공학과)
  • Published : 1991.01.01
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Abstract

Zirconium dioxide(ZrO2) thin films have been deposited by chemical vapor deposition technique involving the application of gas mixture of ZrCl4, and H2O into silicon wafers. The relationships between the deposition rate and various reaction parameters such as the deposition time, the gas flow rate, the deposition temperature, and the composition of reactant gases were studied. The film was identified as nearly stoichiometric monoclinic ZrO2. The apparent activation energy is about 19Kcal/mole at surface chemical reaction controlled region. The deposition rate is mainly influenced by the H2O-forming reacting between CO2 and H2.

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References

  1. Handbook of Electronic Materials v.3 J. T. Milek(eds.)
  2. J. Electrochem. Soc. v.118 Preparation and Properties of Pyrolytic Zirconium Dioxide Films R.N. Tauber;A.C. Dumber;R.E. Caffrey
  3. Thin Solid Films v.153 Characterization of R.F.-Sputtered Zirconia Coatings N. Iwamoto;Y. Makino;M. Kamai
  4. Sov. J. Opt. Technol. v.44 no.11 Dependence of the Index of Refraction and Microporosity of Zirconium Dioxide Films on the Deposition Conditions G.A. Muranova;E.I Fadeeva;A.F. Perveev
  5. Thin Solid Films v.127 Characterization of Plasma-Sprayed Zirconia Coatings by X-ray Diffraction and Raman Spectroscopy N. Iwamoto;N. Umesaki
  6. J. Mater. Sci. v.12 The Fundamentals of Chemical Vapor Deposition W.A. Bryant
  7. Vapor Deposition C.F. Powell(eds.);J.H. Oxley(eds.);J.M. Biocher, Jr.(eds.)
  8. J. Chemical Physics. v.28 no.5 Chemical Equilibrium in Complex Mixtures W.B White;S.M. Johnson;G.B. Dantzig
  9. Acta Chemica Scandinavia v.25 Thermodynamic Studies of High Temperature Equilibria G. Eriksson
  10. J. Am. Ceramic Soc. v.47 Infrared Absorption Spectroscopy in Zirconia Research N.T. McDevitt;W.L. Baun
  11. Ph. D. Thesis S.G. Yoon
  12. Crystal Growth D.W. Shaw(eds.)
  13. Cermical Process Principles O.A. Hougen;K.M. Watson
  14. The Electrochem. Soc N. J Proc. of 9th Int Conf on CVD K. E. Spear
  15. Proceedings of the 4th International Conference on CVD B.J. Curtis;J.P. Dismukes;G.F. Wakefield(ed.);J.M. Blocher, Jr.(ed.)
  16. J. Amer. Ceram. Soc. v.53 P. Wong;M. Robinson