Journal of the Korean Ceramic Society (한국세라믹학회지)

The Korean Ceramic Society (한국세라믹학회)
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Formation of $Nb_2O_5$ Thin Films by Sol-Gel Technique and Analysis of Their Crystalline Phases and Dielectric Characteristics

졸-겔법에 의한 $Nb_2O_5$ 유전박막의 형성 및 박막의 결정상과 유전특성의 분석

  • 조남희 (한국과학기술연구원 재료연구단 유전체세라믹스연구실) ;
  • 강희복 (한국과학기술연구원 재료연구단 유전체세라믹스연구실) ;
  • 이전국 (한국과학기술연구원 재료연구단 광전세라믹스연구실) ;
  • 김윤호 (한국과학기술연구원 재료연구단 유전체세라믹스연구실)
  • Published : 1993.01.01
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Abstract

Sol-gel spin-coating technique was used to produce Nb2O5 thin films on silicon substrates from Nb(OC2H5)5 precursor. The films were heat-treated at temperatures between $600^{\circ}C$ and 100$0^{\circ}C$ in oxygen atmosphere and their crystalline phases, chemical states, and dielectric characteristics were investigated by X-ray diffractometry (XRD), Auger electron spectroscopy (AES), and C-V measurements, respectively. After 1 hour heat-treatment at 80$0^{\circ}C$, T-type Nb2O5 was formed, and its chemical composition was homogeneous with no appreciable SiO2 oxide at interfaces between the films and substrates. The films heat-treated at temperatures between $600^{\circ}C$ and 80$0^{\circ}C$ exhibit dielectric constant of less than 20 while the films heat treated at 100$0^{\circ}C$ show dielectric constant of 28.

Keywords

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