다층 구조로부터 열 확산에 의한 $PbTiO_3$ 박막의 제조

Formation of $PbTiO_3$ Thin Films by Thermal Diffusion from Multilayrs

  • 서도원 (한양대학교 무기재료공학과) ;
  • 최덕균 (한양대학교 무기재료공학과)
  • 발행 : 1993.06.01

초록

$PbTiO_3$ thin films have been formed by rapid thermal annealing(RTA) of $TiO_2$/Pb/$TiO_2$ multilayer films deposited on Si wafers by RF sputtering. Based on the optimal depositon conditions of TiO2 and Pb, $TiO_2$/Pb/$TiO_2$ three layers were deposited for 900$\AA$ each. These films were subjected to RTA process at the temperatures ranging from $400^{\circ}C$ to $900^{\circ}C$ for 30 seconds in air, and were analyzed by X-ray diffraction and transmission electron microscopy to investigate the phases and the microstructures. As a result, perovskite $PbTiO_3$ phases was obtained above $500^{\circ}C$ with the trace of unreacted $TiO_2$. RBS analysis revealed the anisotropic behavior of diffusion that the diffusivity of Pb to the bottom $TiO_2$ layer was faster than that of Pb to the top $TiO_2$ layer. The amorphous Pb-silicate was formed between film and Si substrate due to the diffusion of Pb, but Pb-silicate existed locally at the interface and the amount of that phase was very small. Therefore the effect of bottom $TiO_2$ layer as a diffusion barrier was confirmed. $PbTiO_3$ films formed by current technique showed a relative dielectric constant of 60, and the maximum breakdown field reached 170kV/cm.

키워드

참고문헌

  1. Piezoelectric Ceramics B. Jaffe;W.R. Cook;H. Jaffe
  2. J. Voc. Sci. Tech v.A 9 no.3 Ferroelectric Thin Films for Electronic Applications G.H. Haertling
  3. Mat. Res. Soc. Symp. Proc. v.200 Ferroelectric Thin Film Synthesis, Past and Present R.A. Roy;K.F. Etzold;J.J. Cuomo
  4. J. Appl. Phys. v.60 no.1 Preparation of¹ c-axis Oriented PbTiO₃Thin Films and Their Crystallographic, Dielectric, and Pyroelectric Properties K. Iijima;Y. Tomita;R. Takayama;I. Ueda
  5. Jpn. J. Appl. Phys. v.28 no.Suppl. 28-2 Preparation of Ferroelectric Thin Films by RF Magnetron Sputtering T. Ogawa;A. Senda;T. Kasanami
  6. Jpn. J. Appl. Phys. v.26 no.Suppl. 26-2 Preparation of (Pb, La)TiO₃-PbTiO₃ Thin Films with Supperlattiice Structure H. Adachi;T. Mitsuyu;O. Yamazaki;K. Wasa
  7. 박사학위 논문 초음파분무 MOCVD에 의한 강유전체 박막의 제조 이춘호
  8. 박사학위논문 유기금속 화학증착법을 이용한 Pb계 페로브스카이트 화합물의 박막제조에 관한 연구 황철성
  9. Jpn. J. Appl. Phys. v.25 no.9 Electronic Properties of the Interface Between Si and TiO₂Deposited at Very Low Temperatures T. Fuyuki;H. Matsunami
  10. Appl. Phys. Lett. v.59 no.27 Effects of Crystallite Size in PbTiO₃ Thin Films M. de Keijser;G.J.M. Dormans;P.J. van Veldhoven;D.M. de Leeuw
  11. Handbook of Sputter Deposition Technolgy W. Kikotaka
  12. J. Appl. Phys. v.66 no.12 Preparation of Epitaxial ABO₃perovskite-type oxide thin films on a (100) MgAl₂O₄/Si substrate S. Matsubara;S. Miura;Y. Miyasaka;N. Shohata
  13. Mat. Res. Soc. Symp. Proc. v.243 no.191-193 Microstructure and Electrical Properties of Very Thin PZT Films Deposited by In-Situ Ion Beam Sputtering K.D. Glifford;H. N. Al-Shareef;S.H. Rou;P.D. Hren;O. Auciello;A.I. Kingon
  14. Ceram. Transac., Ferroelectric films v.25 Rapid Thermal Annealing Processed Ferroelectric Films H. Hu;L. Shi;V. Kumar;Krupanidhi
  15. Treatise on Materials Science and Technology, Analytical Techniques for Thin Films v.27 Rutherford Backscattering Spectrometry on Thin Solid Films T.G. Finstad;W.K. Chu;K.N. Tu(Ed.);R. Rosenberg(Ed.)
  16. Ceram. Transac. v.25 Formation of PbTiO₃and PZT Films from Metallic Multilayers Chen C. Li;Seshu B. Desu;A.S. Bhalla(Ed.);K. M. Nair(Ed.)