A Lifetime Prediction Modeling for PMOSFET Degraded by Hot-Carrier (II)

Hot-Carrier로 인한 PMOSFET의 소자 수명시간 예측 모델링 II

In this paper, we present a simple and general lifetime prediction model for PMOSFET by using the correlation between transconductance degradation and gate current influence to solve a problem that that I$_{b}$ is dependent on drain structure. The suggested model is applied to a different channel, drain structured PMOSFET. For all PMOSFETs, dg$_{m}$/g$_{m}$ of PMOSFET appears with one straight line about Q$_{g}$, therefore, this model using I$_{g}$ is consistent with experiment result independently of channel, drain structure. It is, therefore, proposed that a model using I$_{g}$ has a general applicability for PMOSFET's.