Design and Implementation of Rule-based Mask Layout Transformation System

규칙에 기초한 마스크 레이아웃 변환 시스템의 설계 및 구현

Owing to the nature of locality in mask layouts, it appears that most mask layout problems can be solved by transforming a part of the given mask layout into a better layout segment continuously toward a global suboptimal solution. This notion of local transformation addresses major weak points of existing mask layout processing systems, which lack both extensibility and unifiability. This paper attempts to elaborate upon developing a new rule-based mask layout transformation system wherein most of the mask layout problems can be solved under the unified framework of local mask layout transformation. The rule-based mask layout transformation system is applicable to various mask layout problems such as net extraction, mask layout compaction, mask layout editing, and design rule checking. The experimental results show that the rule-based expert system approach is an efficient means of solving those mask layout problems, and thus confronting major drawbacks of existing layout processing systems.