Fabrication and Characteristic of C-doped Base AlGaAs/GaAs HBT using Carbontetrachloride $CCI_4$

$CCI_4$ λ₯Ό μ‚¬μš©ν•˜μ—¬ 베이슀λ₯Ό νƒ„μ†Œλ„ν•‘ν•œ AlGaAs/GaAs HBT의 μ œμž‘ 및 νŠΉμ„±

  • μ†μ •ν™˜ (ν•œκ΅­κ³Όν•™κΈ°μˆ μ› μ „κΈ° 및 μ „μžκ³΅ν•™κ³Ό) ;
  • κΉ€λ™μš± (ν•œκ΅­κ³Όν•™κΈ°μˆ μ› μ „κΈ° 및 μ „μžκ³΅ν•™κ³Ό) ;
  • 홍성철 (ν•œκ΅­κ³Όν•™κΈ°μˆ μ› μ „κΈ° 및 μ „μžκ³΅ν•™κ³Ό) ;
  • κΆŒμ˜μ„Έ (ν•œκ΅­κ³Όν•™κΈ°μˆ μ› μ „κΈ° 및 μ „μžκ³΅ν•™κ³Ό)
  • Published : 1993.12.01

Abstract

A 4${\times}10^{19}cm^{3}$ carbon-doped base AlGaAs/GaAs HBY was grown using carbontetracholoride(CCl$_4$) by atmospheric pressure MOCVD. Abruptness of emitter-base junction was characterized by SIMS(secondary ion mass spectorscopy) and the doping concentration of base layer was confirmed by DXRD(double crystal X-ray diffractometry). Mesa-type HBTs were fabricated using wet etching and lift-off technique. The base sheet resistance of R$_{sheet}$=550${\Omega}$/square was measured using TLM(transmission line model) method. The fabricated transistor achieved a collector-base junction breakdown voltage of BV$_{CBO}$=25V and a critical collector current density of J$_{O}$=40kA/cm$^2$ at V$_{CE}$=2V. The 50$\times$100$\mu$$^2$ emitter transistor showed a common emitter DC current gain of h$_{FE}$=30 at a collector current density of JS1CT=5kA/cm$^2$ and a base current ideality factor of Ξ·S1EBT=1.4. The high frequency characterization of 5$\times$50$\mu$m$^2$ emitter transistor was carried out by on-wafer S-parameter measurement at 0.1~18.1GHz. Current gain cutoff frequency of f$_{T}$=27GHz and maximum oscillation frequency of f$_{max}$=16GHz were obtained from the measured Sparameter and device parameters of small-signal lumped-element equivalent network were extracted using Libra software. The fabricated HBT was proved to be useful to high speed and power spplications.

Keywords