Journal of the Korean Ceramic Society (한국세라믹학회지)

The Korean Ceramic Society (한국세라믹학회)
권호 표지

Effects of Deposition Variables on Plasma-Assisted CVD of TiN Films

TiN박막의 증착특성에 미치는 플라즈마 화학증착변수들의 영향

  • 이정래 (부산대학교 공과대학 무기재료공학과) ;
  • 김광호 (부산대학교 공과대학 무기재료공학과) ;
  • 신동원 (포항대학교 재료금속공학과) ;
  • 박찬경 (포항대학교 재료금속공학과)
  • Published : 1994.10.01
Download PDF
⟨ Previous Next ⟩

Abstract

TiN films were deposited onto high speed steel(SKH9) and silicon wafer by plasma-assisted chemical vapor deposition(PACVD) using a TiCl4/N2/H2/Ar gas mixture. The effects of deposition temperature, R.F. power, and H2 concentration on the deposition of TiN were studied. The residual chlorine content and the microhardness of TiN films were also investigated. It was found that TiN films grew with a columnar structure of a strong (200) preferred orientation regardless of the substrate type and the deposition variables. The TiN films consisted of columnar-grains of about 50 to 100 nm in diameter. The columnar grains themselves contained much finer fibrous grains. As deposition temperature increased, the residual chlorine content decreased sharply. R. F. powder enhanced the deposition rate largely. Increasing of H2 concentration had little effect on the residual chlorine.

Keywords

References

  1. Thin Solid Films v.80 The Plasma-Assisted Chemical Vapour Deposition of TiC,TiN and $TiC_xN_{1-x}$ N.J. Archer
  2. Thin Solid Films v.154 TiN Coatings on M₂Steel Produced by Plasma-Assisted Chemical Vapor Deposition M.R. Hilton;G.J. Vandentop;M. Salmeron;G.A. Somorjai
  3. Thin Solid Films v.161 Influence of Temperature on the Growth of TiN Films by Plasma-Assisted Chemical Vapour Deposition F.H.M. Sanders;G. Verspui
  4. J. Electrochem. Soc. v.136 no.1 Plasma-Enhanced Chemical Vapor Deposition of TiN from TiCi₄/N₂/H₂Gas Mixtures N.J. Ianno;A.U. Ahmed;D.E. Engebert
  5. Proceedings of the 9th International Conferences on Chemical Vapour Deposition Titanium Nitride Coating by Plasma CVD N. Kikuchi;Y. Oosawa
  6. J. Vac. Sct. Technol. v.A7 no.1 The Deposition Rate and Properties of the Deposit in Plasma Enhanced Chemical Vapor Deposition of TiN D.H. Jang;J.H. Chun
  7. Thin Solid Films v.169 The Effects of Reactant Gas Compostion on the Plasma-Enhanced Chemical Vapour Deposition of TiN D.H.Jang.;J.S.Chun
  8. J.Vac.Sci.Technol. v.A7 no.5 Plasma-Assisted Chemical Vapor Deposition of Titanium Nitride in a Capacitvely Coupled Radio-Frequency Dischsarge J.Laimer.;H.Stori
  9. Thin Solid Films v.191 Titanium Nitride Deposited by Plasma-Assisted Chemical Vapour Deposition J.Laimer.;H.Stori
  10. Ph.D.Thesis, KAIST The Study on the Deposition Characteristics and the TiN and $TiC_xN_x$ Coatings by Plasma Assisted Chemical Vapor Deposition S.B.Kim
  11. Thin Solid Films v.195 Effects of N₂-to TiCl₄ Flow Rate Ratio on the Properties of TiN Coatings Formed by D.C. Discharge Plasma-Assisted Chemical Vapor Deposition K.Oguri.;H.Fujita.;T.Arai
  12. J.Kor.Ceram.Soc. v.30 no.2 Low Temperature Deposition of TiN on the Steel Substrate by Plasma Assisted CVD J.R.Lee.;K.H.Kim.;S.J.Cho
  13. Thin Solid Films v.137 Dependence of the Hardness of Titanium Nitride Prepared by Plasma Chemical Vapour Deposition on the Gas Flow Rate and the R.F.Power R.Makabe.;S.Nakajima.;O.Tabata.;M.Aoki
  14. Thin Solid Films v.139 Composition, Morphology and Mechanical Properties of Plasma-Assisted Chemically Vapor-Deposition TiN Films on M₂Tool Steel M.R.Hilton.;L.R.Narasimhan.;S.Nakamura.;M.Salmeron.;G.A.Somorjai
  15. Thin Solid Films v.165 Plasma-Assisted Chemical Vapour Deposition of TiN and TiC on Steel : Properties of Coatings T.Arai.;H.Fujita.;K.Oguri
  16. J.Kor.Ceram.Soc. v.26 no.1 Studies on Film Growth and Mechanical Properties of TiN by Chemical Vapor Deposition S.B.Kim.;K.H.Kim.;S.S.Chun
  17. Thin Solid Films v.158 Dependecne of Microstructure of TiN Coatings on Their Thickness V.Valvoda.;R.Cerny.;R.Kuzel, JR.
  18. Thin Solid Films v.101 Adhesion and Hardness of Ion-Plated TiC and TiN Coatings E.Hummer.;A.J.Perry
  19. Plasma Chemistry and Plasma Processing v.4 no.3 Plasma Chemical Vapor Deposition of TiN L.Shizhi
  20. Ph.D.Thesis, KAIST The Deposition Characteristics and Structural Properties of TiC Deposited by Chemical Vapour Deposition and TiN Deposited by Plasma Enhanced Chemical Vapour Deposition D.H.Jang
  21. Harcourt Brace Jovanovich The Materials Science of Thin Films M.Ohring