The Interfacial Reactions, Phase Equilibria and Electrical Properties of Co/GaAs System

Co/GaAs계의 계면반응, 상평형 밑 전기적 특성에 관한 연구

  • 곽준섭 (연세대학교 금속공학과) ;
  • 백홍구 (연세대학교 금속공학과) ;
  • 신동원 (포항공과대학교 재교금속공학과) ;
  • 박찬경 (포항공과대학교 재교금속공학과) ;
  • 김창수 (한국표준과학연구원 소재특성평가센터) ;
  • 노삼규 (포항공과대학교 재료금속공학과)
  • Published : 1995.08.01

Abstract

Interfacial reactions, phase equilibria and elecrrical properties of Co films on (001) oreinted GaAs substrate, in the temperature range 300-$700^{\circ}C$ for 30min. have been investigated using x-ray diffraction and Augger electron spectropcopy. Cobalt started to react with GaAs at 38$0^{\circ}C$ by formation of Co$_{2}$GaAs phase. At 42$0^{\circ}C$, CoGa and CpAs nucleated at the Co and Co$_{2}$GaAs interface and grew with Co$_{2}$GaAs upto 46$0^{\circ}C$. contacts produced in this annealing regime were rectifying and Schottky varrier heights increased from 0.688eV(as-deposite state) up to 0.72eV(42$0^{\circ}C$). In the subsequent reation, the ternary phase started to decompose and lost stoichiometry at 50$0^{\circ}C$. At higher temperature, Co$_{2}$GaAs disappered and CoGa/CoAs/GaAs layer structures were formed. Contacts produced at higher temperature regime(>50$0^{\circ}C$) showed very low effective barriers. The results of interfacial reactions can be understood from the Co-Ga-As ternary phase diagram.

Keywords

References

  1. Modern GaAs Processing Methods R.Williams
  2. Principles and Technology of MODFETs H.Morkoc(et al.)
  3. J. Vac. Sci.Technol. v.B 10 T.C.Shen;G.B.Gao;H.Morkoc
  4. J. Appl. Phys v.62 T.Sands;V.G.Keramidas;K.M.Yu;J.Washburn;K.Krishnan
  5. J. Electrochem. Soc v.136 J.C.Lin;K.J.Schulz;K.C.Hsieh;Y.A.Chang
  6. Mat.Sci.Eng v.B1 T.Sands
  7. Appl. Phys. Lett. v.47 S.S.Lau;X.X.Chen;E.D.Marshall;C.S.Pai;W.F.Tseng;T.F.Kuech
  8. Mater. Res. Soc. Proc. v.54 R.S.Williams
  9. J. Appl. Phys. v.66 M.Genut;M.Eizenberg
  10. J. Appl. Phys. v.61 R.Beyers;K.B.Kim;R.Sinclair
  11. J. Appl. Phys. v.63 M.Nathan
  12. J. Appl. Phys. v.62 C.J.Palmstrøm;C.C.Chang;A.Yu;G.J.Galvin;J.W.Meyer
  13. Mater. Res. Soc. Proc. v.337 J.S.Kwak;H.K.Baik;J.I.Lee;S.K.Noh;D.W.Shin;C.G.Park
  14. Ph. D. thesis F.Y.Shiau
  15. Electronic Thin Film Science for Electrical Engineers and Materials Scientists K.N.Tu;J.W.Mayer;L.C.Feldman
  16. J. Appl. Phys. v.57 H.Norde
  17. J. Appl. Phys. v.65 C.J.Palmstrøm
  18. Fiz. Tverd. Tela v.7 V.L.Fistu;K.D.Agaev
  19. Appl. Phys. Lett. v.39 J.L.Freeouf;J.M.Woodal