Fabrication of High Power $Al_{0.07}$$Ga_{0.93}$As Laser Diode Array)

고출력 $Al_{0.07}$$Ga_{0.93}$As 레이저 다이오드 어레이 제작

  • 손노진 (포항공과대학교 전자전기공학과) ;
  • 박성수 (포항공과대학교 전자전기공학과) ;
  • 안정작 (포항공과대학교 전자전기공학과) ;
  • 권오대 (포항공과대학교 전자전기공학과) ;
  • 계용찬 (삼성종합연구원) ;
  • 정지채 (고려대학교 전파공학과) ;
  • 최영수 (국방과학연구소) ;
  • 강응철 (국방과학연구소) ;
  • 김재기 (국방과학연구소)
  • Published : 1995.10.01

Abstract

A laser diode(LD) structure consisting of a single 150$\AA$ $Al_{0.07}$Ga$_{0.93}$As quantum well active region operating at ${\lambda}$=809nm, cladded with an AlGaAs graded-index separate confinement heterostructure, has bes been grown by MOCVD. Temperature coefficient of wavelength is approximately 0.2nm $^{\circ}C$ for the diode. The active aperture consists of five emitters separated from each other by means of SiO$_{2}$ deposition and stripe formation, which creates insulating regions that channel the current to 100-$\mu$m-wide stripes placed on 450-$\mu$m centers. From a typical uncoated LD, the output power of 0.8W has been obtained at a 1$\mu$s, 1kHz pulsed current level of 2.0$\AA$, which results in about 64% external quantum efficiency. The threshold current density is 736A/cm$^{2}$ for the case of 500$\mu$m cavity length LD's. The measure of an internal quantum efficiency was 75.8% and the internal loss 4.83$cm^{-1}$ . Finally, 3.1W output power has been obtained at a 1$\mu$s, 1kHz pulsed current level of 9A from the 500$\mu$m-aperture LD array with 460-$\mu$m- cavity length.

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