Fabrication and Analysis of (SAW Self-Aligned Selectively Grown W-gate) MOSFETs

SAW Self-Aligned Selectively Grown W-GAte) MOSFETs (SAW (Self-Algined Selectively Grown W-Gate) MOSFETs의 제작 및 특성 분석

We proposed SAW (Self-Algined Selectively Grown W-Gate) MOSFET structure, and strudied electrical characteristics of the fabricated SAW MOSFETs. The threshold volgate of 0.21${\mu}$m SAW NMOSFET was 0.18 V and that of 0.24 ${\mu}$m SAW PMOSFET was -0.16 V. The subthreshold slope was 74 mV/decade for NMOSFET and 82 mV/decade for PMOSFET. The maximum transconductance of NMOSFET and PMOSFET, at V$_{GS}$=2.5 V and V$_{DS}$=1.5 V, were260 mS/mm and 122 mS/mm. The measured saturation drain current at V$_{GS}$=V$_{DS}$ =2.5 V was 0.574 mA/${\mu}$m for NMOSFET and -0.228 mA/${\mu}$m for PMOSFET. The gate resistance of SAW MOSFET was about m$\Omega$cm and the n+-p junction capacitance of SAW MOSFET was about 10% lowas than that of the conventional MOSFET's.