Journal of the Korean Institute of Telematics and Electronics A (전자공학회논문지A)

The Institute of Electronics and Information Engineers (대한전자공학회)
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Development of integrated TCAD for VLSI process simulation

반도체 공정 시뮬레이션을 위한 통합 TCAD 개발

  • 윤상호 (인하대학교 전자재료공학과) ;
  • 이경일 (인하대학교 전자재료공학과) ;
  • 공성원 (삼성전자㈜ 반도체부문) ;
  • 이재희 (인하대학교 전자재료공학과) ;
  • 원태영 (인하대학교 전자재료공학과)
  • Published : 1996.05.01
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Abstract

A semiconductor process imulator operated in windows$^{TM}$ environment has been developed. two-dimensional process simulation in personal computer has been enabled due to the improvement of CPU speed and the efficient use of memory. The process simulator in this paper is capable of calculating diffusion, oxidation, ion implantation, etching and deposition in two-dimensional manner. In addition, graphic-user-friendly editor, parser, and multi-dimensional graphical routine is also available in the devloped simulator.

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