전자공학회논문지A (Journal of the Korean Institute of Telematics and Electronics A)
- 제33A권12호
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- Pages.47-52
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- 1996
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- 1016-135X(pISSN)
AlCu 플라즈마 식각후 Al 결정입계에서 Al 부식현상
Al corrosion phenomena on the Al grain boundary after AlCu plasma etching
초록
Cl-based gas chemistry is generally used to etching for al alloy metallization. After the etching of Al alloy with Cl-based gas plasma, residual chlorine on Al alloy reacts with H
키워드