Journal of the Korean Crystal Growth and Crystal Technology (한국결정성장학회지)

The Korea Association of Crystal Growth (한국결정성장학회)
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Titanium dioxide by spray deposition for buried contact silicon solar cells fabrication

전극함몰형 실리콘 태양전지의 제작시 스프레이 방법에 의한 타이타늄 옥사이드층의 적용에 관한 연구

  • A.U. Ebong (C.B. Honsberg, S.R. Wenham and X. Coudounaris Center for Photovoltaic Devices and Systems, School of Electrical Engineering, The University of New South Wales, Sydney 2052, Australia) ;
  • S.H. Lee (Photovoltaic devices laboratory, Samsung Advanced Institute of Technology, P.O. Box 111, Suwon 440-600, Korea)
  • Published : 1996.05.01
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Abstract

Titanium dioxide ($TiO_{2}$) film has been widely used as anti-reflection coating for solar cells but not as masking oxide for metallisation and diffusion of impurities. In this paper we have investigated the properties of $TiO_{2}$ for possible incorporation into solar cell processing sequence. Thus the use of a spray deposition system to form the $TiO_{2}$ film and the characterisation of this film to ascertain its suitability to solar cell processing. The spray-on $TiO_{2}$ film was found to be resistant to all the chemicals used in conjunction with solar cell processing. The high temperature anealing (in oxygen ambient) of the spray-on $TiO_{2}$ film resulted in an increased refractive index, which indicated the growth of an underlying thin film of $SiO_{2}$ film for the passivation of silicon surface which would reduce the recombination activities of the fabricated device. Most importantly, the successful incorporation of the $TiO{2}$ film will lead to the reduction of the many high temperature processing steps of solar cell to only one.

타이타늄 옥사이드층을 태양전지의 표면 보호막으로 사용시, 그 적합성에 대해 조사하였다. 스프레이법으로 형성된 타이타늄 옥사이드의 박막층은 태양전지 제조 과정중 사용되는 화학약품에 잘 견디며, 이 층을 사용함으로서 고온산화공정을 줄일 수 있다.

Keywords

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