Influences of Electrochemical Vapor Deposition Conditions on Growth Rate ad Characteristics of YSZ Thin films(II)

YSZ 박막의 성장속도와 특성에 미치는 전기화학증착의 조건의 영향(II)

  • 박동원 (경북대학교 공과대학 금속공학과) ;
  • 전치훈 (경북대학교 공과대학 금속공학과) ;
  • 김대룡 (경북대학교 공과대학 금속공학과)
  • Published : 1996.03.01

Abstract

Yttria stabilized zirconia (YSZ) thin films were prepared by the electrochemical vapor deposition (EVD) method on the porous Al2O3 substrates. Y2O3 mol% of thin film was linearly increased with yttrium mole fraction of vapor phase. As yttrium mole fraction(Zyc13=0.18) increased dense and faceted thin films were enhanced. However as the yttrium mole fraction (Zyc13=0.04) decreased porous thin films with monoclinnic phase prevailed. With increasing pressure difference of substrate sides penetration depth decreased porosity and amount of monoclinic phase in the films increased.

Keywords

References

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