한국재료학회지 (Korean Journal of Materials Research)
- 제6권9호
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- Pages.861-870
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- 1996
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- 1225-0562(pISSN)
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- 2287-7258(eISSN)
Co 단일층과 Co/Ti 이중층에 의하여 형성된 코발트 실리사이드막의 구조
Investigation of Thin Film Structures of Cobalt Silicides Formed with a Co Monolayer and a Co/Ti Bilayer
- Lee, Jong-Mu (Dept.of Metallurgical Engineering, Inha University) ;
- Lee, Byeong-Uk (Dept.of Metallurgical Engineering, Inha University) ;
- Gwon, Yeong-Jae (Dept.of Metallurgical Engineering, Inha University) ;
- Kim, Yeong-Uk (Samsung Electronics Corporation) ;
- Lee, Su-Cheon (Samsung Electronics Corporation)
- 발행 : 1996.09.01