SIMULTANEOUS DETERMINATION OF OPTICAL CONSTANTS AND DEPTH-PROFILE OF SPUTTERED AMORPHOUS TiO$_2$ THIN FILMS

Amorphous $TiO_2$ thin films were deposited on silicon substrates by the RF magnetron sputtering under various conditions, and studied by the spectroscopic ellipsometry (SE). To determine the optical constants as a function of photon energy and also to depth-profile the as-deposited $TiO_2$ thin films, we analyzed the ellipsometric spectra using the effective medium approximation and the dispersion equations. Especially, we improved the modeling accuracy by selectively using either the Sellmeier or the Forouhi and Bloomer dispersion equation in different energy regions.