Journal of the Korean Applied Science and Technology (한국응용과학기술학회지)

The Korean Society of Applied Science and Technology (한국응용과학기술학회)
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Synthesis and Photocharacteristics of Trihydric Phenol Photoresist

Trihydric Phenol계 Photoresist의 합성과 그 감광 특성

  • Hong, Eui-Suk (Dept. of Chemical Engineering, Myong Ji University) ;
  • Ko, Jae-Yong (Dept. of Chemical Engineering, Myong Ji University) ;
  • Park, Hong-Soo (Dept. of Chemical Engineering, Myong Ji University)
  • 홍의석 (명지대학교 공과대학 화학공학과) ;
  • 고재용 (명지대학교 공과대학 화학공학과) ;
  • 박홍수 (명지대학교 공과대학 화학공학과)
  • Published : 1996.05.31
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Abstract

Cinnamoyl ester(PGEFC) of poly(phloroglucinol-formaldehyde) glycidyl ether which has photosensitive functional group was prepared to apply to photoresist. Photosensitivity of PGEFC was estimated by the solubility difference in organic solvent before and after exposure to light. The yield of residual film was calculated by immersing the sample-coated quartz plates in the solvent which was used in coating. The yield of the residual film which was closely related to the sensitivity of the film, was affected by the degree of polymerization of the backbone resin, sensitizers and their concentration. The sensitivity was depended upon the degree of polymerization. Most of effective sensitizer for PGEFC among the sensitizers was 2, 6-dichloro-4-nitroaniline.

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