Characterization and Preparation of a-axis Preferred Oriented PLZT(x/0/100) Thin Films Deposited by RF-magnetron Sputtering Process

RF-magnetron Sputtering Process를 이용한 a-축 우선 배향된 PLZT(x/0/100)박막의 제조

  • Park, Myung-Sik (Department of Inorganic Materials Engineering, Kyungpook National University) ;
  • Kang, Seung-Kuk (Department of Inorganic Materials Engineering, Kyungpook National University) ;
  • No, Kwang-Soo (Department of Materials Science and Engineering, KAIST) ;
  • Kim, Dong-Num (Research and Development Laboratory, LG Electro-Components Ltd.) ;
  • Cho, Sang-Hee (Department of Inorganic Materials Engineering, Kyungpook National University)
  • 박명식 (경북대학교 무기재료공학과) ;
  • 강승국 (경북대학교 무기재료공학과) ;
  • 노광수 (한국과학기술원 재료공학과) ;
  • 김동범 ((주)LG전자부품연구소) ;
  • 조상희 (경북대학교 무기재료공학과)
  • Published : 1997.06.01

Abstract

RF-magnetron Sputtering Process를 이용하여 Pt/Ti/Si(100)기판위에 lanthanum-modified lead titanate 박막을 제작하였다. 기판온도와 증착시간이 증가함에 따라 증착율은 감소하였다. 기판온도가 증가함에 따라 fine grain들은 large grain으로 변화하였다. Perovskite구조는 기판온도 54$0^{\circ}C$, gas pressure 30mtorr에서 나타나기 시작하였다. 본 실험에서 perovskite 박막제작에 대한 조건은 기판온도 58$0^{\circ}C$, gas pressure 30mtorr였다. Pt/Ti/Si(100) 우선 배향된 박막을 얻었다. La양이 증가함에 따라 유전율, 항전계, 잔류분극량은 증가하였다. 중심주파수가 44.7MHz, 전파속도는 2680m/sec를 가지는 SAW filter 특성을 얻었다.

Keywords

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