Polymer Science and Technology (한국고분자학회지:고분자과학과기술)
- Volume 8 Issue 5
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- Pages.635-643
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- 1997
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- 1225-0260(pISSN)
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- 2586-1476(eISSN)
Photoresist for Microlithography Based on Chemical Amplification Concept
화학증폭개념에 바탕을 둔 반도체용 초미세가공 재료
- Moon, Seong-Yun (Polymer Materials Lab., Chemical Sector, Samsung Advanced Institute of Technology) ;
- Oh, Seung-Hun (Polymer Materials Lab., Chemical Sector, Samsung Advanced Institute of Technology) ;
- Koo, Jae-Sun (Polymer Materials Lab., Chemical Sector, Samsung Advanced Institute of Technology) ;
- Lee, Sang-Kyun (Polymer Materials Lab., Chemical Sector, Samsung Advanced Institute of Technology) ;
- Park, Dong-Won (Polymer Materials Lab., Chemical Sector, Samsung Advanced Institute of Technology)
- 문성윤 (삼성종합기술원 케미컬Sector 고분자재료) ;
- 오승훈 (삼성종합기술원 케미컬Sector 고분자재료) ;
- 구재선 (삼성종합기술원 케미컬Sector 고분자재료) ;
- 이상균 (삼성종합기술원 케미컬Sector 고분자재료) ;
- 박동원 (삼성종합기술원 케미컬Sector 고분자재료)
- Published : 1997.10.31
Abstract
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