EPD 신호궤적을 이용한 플라즈마 식각공정의 실시간 이상검출

Real-time malfunction detection of plasma etching process using EPD signal traces

  • 차상엽 (연세대학교 전기공학과) ;
  • 이석주 (연세대학교 전기공학과) ;
  • 고택범 (연세대학교 전기공학과) ;
  • 우광방 (연세대학교 전기공학과)
  • 발행 : 1998.04.01

초록

This paper presents a novel method for real-time malfunction detection of plasma etching process using EPD signal traces. First, many reference EPD signal traces are collected using monochromator and data acquisition system in normal etching processes. Critical points are defined by applying differentiation and zero-crossing method to the collected reference signal traces. Critical parameters such as intensity, slope, time, peak, overshoot, etc., determined by critical points, and frame attributes transformed signal-to symbol of reference signal traces are saved. Also, UCL(Upper Control Limit) and LCL(Lower Control Limit) are obtained by mean and standard deviation of critical parameters. Then, test EPD signal traces are collected in the actual processes, and frame attributes and critical parameters are obtained using the above mentioned method. Process malfunctions are detected in real-time by applying SPC(Statistical Process Control) method to critical parameters. the Real-time malfunction detection method presented in this paper was applied to actual processes and the results indicated that it was proved to be able to supplement disadvantages of existing quality control check inspecting or testing random-selected devices and detect process malfunctions correctly in real-time.

키워드

참고문헌

  1. IEEE Trans. Semicaonductor Manufacturing v.8 no.1 Time series modeling of reactive ion etching using neural networks M. D. Baker;C. D. Himmel;G. S. May
  2. VLSI Technology, (2nd Edition) S. M. Sze
  3. Semiconductor Intregrated Circuit Processing Technoligy W. R. Runyan;K. E. Bean
  4. Proc. 1993 World Congr. Neural Networks v.I Neural network control charts for locations and variance process shifts H. Yazici;A. E. Smith
  5. US Patent 4861419 Apparatus and method for production process diagnosis using dynamic time warping B. E. Flinchbaugh;S. B. Dolins;A. S. Richardson;J. R. Waxahachie
  6. Plasma Etching:An Introduction D. M. Manos;D. L. Flamm
  7. Speech Communication Human and Machine D. O'Shaughnessy
  8. Fundamentals of Computer Algorithms Horwitz;S. Sahni
  9. IEEE Trans. Semiconductor Manufacturing v.7 no.2 Supervisory run-to-run control of polysilicon gate etch using in situ ellipsometry S. W. Butler;J. A. Stefani
  10. IEEE Trans. Semiconductor Manufacturing v.7 no.1 Statistical feedback control of a plasma etch process P. K. Mozumder;G. G. Barna
  11. Xinix EPD System User's Manual
  12. DT-2831 Hardware User's Manual
  13. DT-VEE Data Awqusition Software Reference Manual
  14. Opti-probe 2000 System Operation Manual
  15. U.S patent 5097430 Method and apparatus for endpoint detection in a semiconductor wafer etching system P. Ebbing
  16. 석사학위논문, 연세대학교 심전도 자동진단을 위한 파라미터 추출 알고리즘에 관한 연구 이정환
  17. 전자공학회 하계종합학술대회 변곡비에 의한 EGC 신호의 특징점 검출 및 QRS 패턴분류 황선철;이명호
  18. Computer Biomedical Research v.19 The determination of peaks in biological waveforms R. J. Marshall
  19. Computer Programs in Biomedicine v.14 An Algorithm for the detection of peaks in biological signals S. R. Dumpala;S. N. Reddy;S. K. Sarma
  20. IEEE Trans. Semiconductor Manufacturing v.7 no.1 Statistical feedback control of a plasma etch process P. K. Mozumer;G. G. Barna
  21. Introduction to Statistical Quality Control(2nd ed) D. C. Motgomery
  22. Technometrics v.33 no.1 Multivariate quality control based on regression-adjusted variables D. M. Hawkins