Characterization of Semiconductor Using Neutron Activation Analysis-II - Manufacturing Process and Surface Depth Profile Analysis -

중성자 방사화분석법에 의한 반도체 특성조사-II - 반도체 제조공정 및 표면 적층분석 -

  • Kim, Nak Bae (Analysis Research Division, Korea Institute of Geology, Mining and Materials)
  • 김낙배 (한국자원연구소 분석연구부)
  • Published : 1998.12.25