References
- J. Crystal Growth v.193 M. Watanabe(et al.)
- The Eleventh Symposium on Chemical Engineering Yoo Cheol Won;K. Kakimoto;H. Ozoe
- Chemical Engineering Science v.49 Z. Jiang;R.A. Brown
- J. Crystal Growth v.198;199 K. Kakimoto;S. Kikuch;H. Ozoe
Journal of the Korean Crystal Growth and Crystal Technology (한국결정성장학회지)
- Volume 9 Issue 4
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- Pages.381-383
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- 1999
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- 1225-1429(pISSN)
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- 2234-5078(eISSN)
Macroscopic and microscopic mass transfer in silicon czochralski method
- Kakimoto, Koichi (Institute of Advanced Materials Study, Kyushu University)
- Published : 1999.08.01
Abstract
First topic of this paper aims to clarify how oxygen and heat transfer in silicon melt under cusp-shaped magnetic fields. We obtained asymmetric temperature distribution by using time dependent and three-dimensional calculation. Second topic is study on molecular dynamics simulation, which was carried out to estimate diffusion constants of oxygen in silicon melt.
Keywords