Journal of the Korean Ceramic Society (한국세라믹학회지)

The Korean Ceramic Society (한국세라믹학회)
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Preparation of Nb doped SrTiO$_3$ Film by Pulsed Laser Deposition and Optimum Processing Conditions

Plused Laser Depositon을 이용한 Nb doped SrTiO$_3$ 박막의 제작과 최적 조건

  • 안진용 (아주대학교 재료공학과) ;
  • ;
  • 최승철 (아주대학교 재료공학과)
  • Published : 1999.02.01
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Abstract

0.5 wt%Nb-doped SrTiO3(Nb: STO) thin film was prepared on MgO(100) single crystal substrates by Pulsed Laser Deposition (PLD). The Crystallinity and the orientation of Nb:STO thin films were characterized by XRD with changing the thin film processing condition-oxygen partial pressure, substrate temperature, deposition time and the distance between target and substrate. The orientation of Nb:STO thin film showed (100), (110) and (111) orientations at the substrate temperature of $700^{\circ}C$. The lattice parameter of Nb:STO decreased with increasing Po2 and showed 0.3905 nm at Po2=100 Pa, which was similar to that of the bulk. The thickness of Nb:STO thin film increased with increasing the deposition time and with decreasing the distance between target and substrate.

MgO 단결성 (100) 기판 위에 0.5 wt% Nb 첨가된 전기전도성의 SrTiO3 (Nb:STO) 박막을 Pulsed Laser Deposition 법으로 제조하였다. 산소압력, 타겟과 기판거리, 기판온도, 박막증착시간 등의 박막형성 조건을 다양하게 변화시켜 Nb:STO박막의 격자상수와 박막두께의 변화를 조사하였다. $700^{\circ}C$에서 제작한 0.5 wt% Nb doped SrTiO3 박막의 배향성은 산소분압변화에 따라(100), (110)과 (111)배향이 관찰되었고, 박막제조시의 산소분압이 79.8 Pa로 증가됨에 따라 격자상수는 감소하여 벌크값인 0.390 nm에 근접하였다. 증착시간증가에 따른 박막의 두께는 증착시간에 비례하여 증가하였고, 격자상수의 변화는 거의 없었다. 타겟과 기판사이의 거리가 멀어짐에 따라 박막의 두께는 감소하였으나, 격자상수에는 큰 변화가 없었고 박막두께분포의 균일성이 향상되었다.

Keywords

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