Etching Characteristics of Er-doped Sodium Borosilicate Glass Film Fabricated by Aerosol Flame Deposition Method

Aerosol Flame Deposition 법에 의해 제조된 Er 첨가 Soldium Borosilicate 유리박막의 식각 특성에 관한 연구

  • Published : 1999.09.01

Abstract

The etching characteristics of Er-doped sodium borosilicate glass film for the planar optical waveguides were investigated using reactive ion etching. The etch rate decreased as the pressure in creased but increased as the RF power increased. The etch rate increased as the flow rate C2F gas and the amount of O2 addition increased but decreased over critical point (C2F6 7,5 accm O2 20%) The etch rate was 180${\AA}$/min under C2F6 7.5 sccm O2 20% RF power 270 W, pressure 150 mTorr. With this optimum etching condition and subsequent heat treatment at 975$^{\circ}C$ for 30 minutes planar optical waveguides having improved sidewall roughness were fabricated successfully.

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