Effects of axial external magnetic fields on plasma density on substrate in helical resonator plasma source

헬리칼 공명 플라즈마에서 축 방향의 외부 자장이 기판상의 플라즈마 밀도에 미치는 영향

  • 김태현 (경북대학교 공과대학 전자전기공학부) ;
  • 태흥식 (경북대학교 공과대학 전자전기공학부) ;
  • 이용현 (경북대학교 공과대학 전자전기공학부) ;
  • 이호준 (위덕대학교 공과대학 전기공학과) ;
  • 이정해 (홍익대학교 공과대학 전자전기공학부) ;
  • 최경철 (현대전자산업주식회사)
  • Published : 1999.03.01

Abstract

The axial distributions of plasma density in a helical resonator plasma with the external magnetic field have been measured using Langmuir probes. Net RF power is set to 200W and chamber pressure is varied from 0.4 mTorr to 100mTorr there are three kinds of eternal magnetic field structure applied on the helical resonator plasma. One is a uniform magnetic field, the second is a positive gradient magnetic field and the third is a negative gradient magnetic field. In the three magnetic field structures, the negative gradient magnetic field is found to show the highest increase in plasma density on the substrate compared with other magnetic structures. Plasma density profile in helical resonator is well consistent with electromagnetic field pattern obtained by computer simulation. It is also found that axial magnetic fields do not affect plasma density distribution in the plasma reactor region, but induce the increase of plasma density in the process chamber region. In order to avoid the nonuniformity of radial density profile, weak magnetic fields under 100G are applied.

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References

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