An Analysis of Generation and Growth of Multicomponent Particles in the Modified Chemical Vapor Deposition

수정된 화학증착공정에서 다종 성분 입자 생성 및 성장 해석

An analysis of generation and growth of multicomponent particles has been carried out to predict the size and composition distributions of particles generated in the Modified Chemical Vapor Deposition(MCVD) process. In MCVD process. scale-up of sintering and micro-control of refractive index may need the Information about the size and composition distributions of $SiO_2-GeO_2$ particles that are generated and deposited. The present work solved coupled steady equations (axi-symmetric two dimensions) for mass conservation, momentum balance. energy and species(such as $SiCl_4$, $GeCl_4$, $O_2$, $Cl_2$) conservations describing fluid flow. heat and mass transfer in a tube. Sectional method has been applied to obtain multi-modal distributions of multicomponent aerosols which vary in both radial and axial directions. Chemical reactions of $SiCl_4$ and $GeCl_4$ were included and the effects of variable properties have also been considered.