Abstract
$(Bi_{0.15}Sb_{0.85})_2Te_3$ and $(Bi_{1-x}Sb_x)_2Te_3$ thermoelectric thin films were prepared by magnetron sputtering process, and their thermoelectric characteristics were investigated with variation of the sputtering condition and the $Sb_2Te_3$ content. The $(Bi_{0.15}Sb_{0.85})_2Te_3$ film, deposited by DC sputtering at $300^{\circ}C$ with rotating the Corning glass substrate at 10 rpm, was fully crystallized to $(Bi,Sb)_2Te_3$ phase with c-axis preferred orientation. This $(Bi_{0.15}Sb_{0.85})_2Te_3$ film exhibited the Seebeck coefficient of 185 $\mu$V/K which was higher than the values of other $(Bi_{0.15}Sb_{0.85})_2Te_3$ films fabricated with different sputtering conditions. With increasing the $Sb_2Te_3$ content, the Seebeck coefficient and electrical resistivity of p-type $(Bi_{1-x}Sb_x)_2Te_3$ (0.77$\leq$x$\leq$1.0) film were lowered. Among p-type $(Bi_{1-x}Sb_x)_2Te_3$ films, a maximum power factor of $0.79{\times}10^{-3}W/K^2-m$ was obtained at (Bi_{0.05}Sb_{0.95})_2Te_3$ composition..
마그네트론 스퍼터링법으로 p형 ($Bi_{0.15}Sb_{0.85})_2Te_3$과 ($Bi_{1-x}Sb_x)_2Te_3$ 열전박막을 제조하여 스퍼터 증착 조건 및 $Sb_2Te_3$ 함량에 따른 열전특성을 분석하였다. Corning glass 기판을 10rpm으로 회전시키며 DC 스퍼터링법으로 $300^{\circ}C$에서 증착한($Bi_{0.15}Sb_{0.85})_2Te_3$ 박막은 $(Bi, Sb)_2Te_3$ 단일상으로 결정화가 완료되고 c축 우선배향성을 나타내었으며, 다른 조건으로 증착한 ($Bi_{0.15}Sb_{0.85})_2Te_3$ 박막보다 높은 185 $\mu$V/K의 Seebeck 계수를 나타내었다. p형(Bi$_{1-x}$ Sb$_{x}$)$_2$Te$_3$ (0.77$\leq$x$\leq$ 1.0) 박막에서는 Sb$_2$Te$_3$ 함량이 증가함에 따라 Seebeck 계수와 전기비저항이 감소하였으며($Bi_{1-x}Sb_x)_2Te_3$조성에서 $0.79\times10^{-3}W/K^2$-m의 최대 출력인자를 나타내었다.
