The Fabrication of Er/Al Co-doped Silica Films for 1.55 $\mu\textrm{m}$ Optical Amplifier

1.55 $\mu\textrm{m}$ 광증폭기용 Er/Al 첨가 광도파막의 제조

  • 노성인 (한양대학교 세라믹공학과) ;
  • 김재선 (한양대학교 세라믹공학과) ;
  • 정용순 (한양대학교 세라믹공학과) ;
  • 신동욱 (한양대학교 세라믹공학과) ;
  • 송국현 (산업자원부 기술표준원 광전자재료과)
  • Published : 2001.12.01

Abstract

In this research, the fabrication of Si/SiO$_2$optical waveguide amplifier by FHD(Flame Hydrolysis Deposition) and Solution Doping was carried out. It was observed that the reduction of fluorescence was prevented up to 0.14 wt% Er whn 0.48 wt% Al was doped and the FWHA of $1.5mutextrm{m}$ fluorescence band increased by 5 nm as increasing amount of Al. Therefore from these results, we could confirm depressing concentration quenching of Er ions and increasing FWHM of fluorescence spectrum by addition of Al.

본 연구에서는 화염가수분해증착법(Flame Hydrolysis Deposition : FHD)을 이용하여 실리콘(Si)/실리카(SiO$_2$) 광도파막을 제조하고, 이 박막에 Solution Doping 법을 이용해 Er/Al을 복합 첨가하여 광증폭 매질을 제작하는 연구를 수행하였다. 형광 측정을 통해 Al의 복합첨가에 의한 형광효율의 감소 방지 및 형광 스펙트럼의 반치폭 증가를 확인할 수 있었다. 즉, Al가 0.48wt%가 첨가된 경우, Er가 0.14wt% 첨가되는 경우에도 형광세기가 감소하지 않음을 확인하였으며, $1.5mu extrm{m}$ 대역의 형광스펙트럼의 대역폭이 약 5nm 정도 증가됨을 관찰하였다.

Keywords

References

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