Korean Journal of Materials Research (한국재료학회지)

Materials Research Society of Korea (한국재료학회)
권호 표지

Characterization of $SnO_2$ Thin Films Prepared by Thermal-CVD

열화학증착법으로 제조된 $SnO_2$박막의 특성

  • Ryu, Deuk-Bae (Depatrment of Materials Engineering, Sun Moon University) ;
  • Lee, Su-Wan (Depatrment of Materials Engineering, Sun Moon University)
  • Published : 2001.01.01
Download PDF
⟨ Previous Next ⟩

Abstract

Transparent and conducting tin oxide thin films were prepared on soda lime silicate glass by thermal chemical vapour deposition. Thin films were fabricated from mixtures of tetramethyltin (TMT) as a precursor, oxygen or oxygen containing ozone as an oxidant. The properties of fabricated tin oxide films are highly changed with variations of substrate temperature. Optimized thin films could be prepared on TMT, which flow rate of 8 sccm, oxygen flow rate of 150 sccm and substrate temperature of 38$0^{\circ}C$. We reduced deposition temperature about$ 180^{\circ}C$ by using of oxygen containing ozone instead of pure oxygen and resistivity of thin films was decreased from ~ ${\times}10^{-2}{\Omega}cm$ to ~${\times}10^{-3}{\Omega}cm$.

유리기판 위에 열화학증착법으로 투명전도성 산화주석막을 제조하였다. 박막은 원료물질로 tetramethyltin(TMT), 산화제로 산소나 오존이 포함된 산소의 혼합물로부터 제조되었다 제조된 박막은 기판온도에 따라 물성이 크게 변하였고 최적화된 박막은 TMT 유랑 8 sccm, 산소유량 150 sccm, 기판온도 $380^{\circ}C$에서 제조되었다. 오존을 사용함으로서 기판온도를 약 $180^{\circ}C$정도 낮출 수 있었고 비저항은 ~$10^{ -2}{\Omega}cm$에서 ~$10^{-3}{\Omega}cm$으로 감소시킬 수 있었다.

Keywords

References

  1. M.A. Aegerter et al., , Journal of Non- Crystalline Solids, 218, 123, (1997) https://doi.org/10.1016/S0022-3093(97)00134-8
  2. K. Suzuki and M. Mizuhashi, , Thin Solid Films, 97, 119, (1998) https://doi.org/10.1016/0040-6090(82)90221-8
  3. J.B. Mooney and S.B. Reading, Ann. Rev Mater. Sci., 12, 81, (1982) https://doi.org/10.1146/annurev.ms.12.080182.000501
  4. J. Vetron and Y.W. Chung, J. Vac. Sci. Technol., A9, 3014, (1991)
  5. E. Shanti, A. Banerjee, V. Dutta and K. L. Chopra, J. Applied Physics, 53, 1615, (1982) https://doi.org/10.1063/1.330619
  6. G. Shanon, R. Rup, and A. Mansingh, Thin Solid Films, 190, 287, (1990) https://doi.org/10.1016/0040-6090(89)90918-8
  7. H.L. Hartnagel, A.L. Dawar, A.K. Jain, and C. Jagadish, 'Semiconducting Transparent Thin Films', IOP publishing Ltd (1995)
  8. J.M. Madsen, Z. Cui, and C.G. Takoudis, J. Applied Physics, 87, 2046, (2000) https://doi.org/10.1063/1.372134
  9. R.O. Suzuki, T. Ogawa, and K. Ono, J. Am. Ceram. soc., 82, 2033, (1999)
  10. S.-W. Lee, C. Yoon, J.-I. Park, and K.-J. Park, J. Kor. Vac. Soc., 8, 201, (1999)
  11. G. Haacke, J. Appl. Phy., 47, 64086, (1976) https://doi.org/10.1063/1.323240
  12. F. Simonis, M.V. Leij, and C.J. Hoogendoorn, Solar Energy Mater., 1, 221, (1979) https://doi.org/10.1016/0165-1633(79)90040-6
  13. F. Abeles, 'Optical properties of solids', Amsterdam : North-Holland (1972)
  14. F. Javier Yusta et al., J. Mater. Chem. 7, 1421, (1997) https://doi.org/10.1039/a608525c