Effects of F-treatment on the Degradation of $Mg_2$Ni type Hydrogen Storage Alloy Electrode

$Mg_2$Ni계 수소저장합금전극의 퇴화거동에 미치는 불화 처리 영향

  • 김준성 (한양대학교 공과대학 재료공학부) ;
  • 최재웅 (한양대학교 공과대학 재료공학부) ;
  • 이창래 (한양대학교 공과대학 재료공학부) ;
  • 강성군 (한양대학교 공과대학 재료공학부)
  • Published : 2001.04.01

Abstract

Effects of the surface fluorination on the electrochemical charge-discharge properties of $Mg_2$Ni electrode in Ni-MH batteries fabricated by mechanical alloying were investigated. After 20h ball milling, Mg and Ni powder formed nanocrystalline $Mg_2$Ni. Discharge capacity of this alloy increased greatly at first one cycle, but due to the formation of Mg(OH)$_2$ passive layer, it showed a rapid degradation in alkaline solution within 10cyc1es. In case of 6N KOH +xN KF electrolyte (x = 0.5, 1, 2), a continuous and stable fluorinated layer formed by adding excess F$^{[-10]}$ ion, increased durability of $Mg_2$Ni electrode greatly and high rate discharge capability(90-100mAh/g). 2N KF addition led to the highest durability of all tested here. The reason of the improvement is due to thin MgF$_2$, which can prevent the $Mg_2$Ni electrode from forming Mg(OH)$_2$layer that is the main cause of degradation.

기계적 합금화 방법을 이용하여 제작한 Ni-MH 전지용 $Mg_2$Ni전극의 표면 불화처리에 대한 전기화학적 충.방전 특성이 조사되었다. 20시간 밀링을 통해 제조된 $Mg_2$Ni합금은 나노결정을 가졌으며 그 $Mg_2$Ni전극의 KOH전해질내에서 충.방전 실험 결과, 초기 방전 용량이 280mAh/g이상으로 증가하였으나 10cyc1e이내에 급격히 퇴화되었다. 전극표면에서 지속적이고 안정한 불화층 형성을 목적으로 KOH용액에 잉여의 불소이온이 첨가된 $Mg_2$Ni전극의 내구성은 크게 향상되었으며 특히 2N KF를 첨가했을 경우 전극의 내구성이 가장 크게 향상되었다. 고율 방전실험의 경우도 그 성능이 90-100mAh/g으로 유지되었다 이러한 내구성 향상의 이유는 표면에 얕고 다공성인 $Mg_2$Ni층의 형성으로 인해 퇴화의 주요인인 Mg(OH)$_2$의 생성이 억제되었기 때문이었다. Effects of the surface fluorination on the electrochemical charge-discharge properties of $Mg_2$Ni electrode in Ni-MH batteries fabricated by mechanical alloying were investigated. After 20h ball milling, Mg and Ni powder formed nanocrystalline $Mg_2$Ni. Discharge capacity of this alloy increased greatly at first one cycle, but due to the formation of Mg(OH)$_2$ passive layer, it showed a rapid degradation in alkaline solution within 10cyc1es. In case of 6N KOH +xN KF electrolyte (x = 0.5, 1, 2), a continuous and stable fluorinated layer formed by adding excess F$^{-}$ ion, increased durability of $Mg_2$Ni electrode greatly and high rate discharge capability(90-100mAh/g). 2N KF addition led to the highest durability of all tested here. The reason of the improvement is due to thin MgF$_2$, which can prevent the $Mg_2$Ni electrode from forming Mg(OH)$_2$layer that is the main cause of degradation.

Keywords

References

  1. T.Kitamura, C.Iwakura, H.Tamura, Electrochim. Acta, 27, 1723 (1982) https://doi.org/10.1016/0013-4686(82)80169-2
  2. T.Nejat Verziroglu, Int. J. Hydrogen Energy, 20, 1 (1995) https://doi.org/10.1016/0360-3199(94)00099-L
  3. B.K.Zitos, D.L.Hudson, P.D.Bennett and VJ. Puglisi, Electrochem. Soc. Proc, 92,168 (1992)
  4. T.Sakai, H.Miyamura, N.Kuriyama, A.Kato, K. Oguro and H.Ishicawa, J. Electrochem. Soc, 137, 795 (1990) https://doi.org/10.1149/1.2086557
  5. N.H.Goo, J.H.Woo, K.S.Lee, J. Alloys Compd., 288, 286 (1999) https://doi.org/10.1016/S0925-8388(99)00100-0
  6. J.H.Woo, K.S.Lee, J. Electrochem. Soc., 146(3), 819(1999) https://doi.org/10.1149/1.1391687
  7. H.Ishkawa, K.Oguru, A.Kato, H.Suzuki, E.Ishii, J. Less Common Met., 120(1), 123 (1986) https://doi.org/10.1016/0022-5088(86)90634-X
  8. T.Sakai, H. Is hikawa, K.Oguru, C. Iwakura, H. Yoneyama, J. Electrochem. Soc, 134(3), 558 (1997)
  9. F.J.Liu, S.Suda, J. Alloys Compd., 190(1), 57 (1992) https://doi.org/10.1016/0925-8388(92)90173-7
  10. X.L.Wang, S.Suda, J. Alloys Compd., 227(1), 58 (1995) https://doi.org/10.1016/0925-8388(95)01624-4
  11. M.Sakashita, Z.P.Li, S.Suda, J. Alloys Compd., 253-254,500 (1997)
  12. X.L.Wang, N.Haraikawa, S.Suda, J. Alloys Compd., 231, 397 (1995) https://doi.org/10.1016/0925-8388(95)01854-9
  13. M.Kanda, J. Met. Finish. Soc Jpn., 48(12), 1169 (1997)
  14. L.Zaluski, A.Zaluska, J.O.Storm-01sen, J. Alloys Compd., 217, 245 (1995)
  15. L.Zaluski, A.Zaluska, P.Tessier, J.O.Strom-Olsen, R.Schulz, J. Alloys Compd., 217, 295 (1995) https://doi.org/10.1016/0925-8388(94)01358-6
  16. N.Cui, J.L.Luo, Electrochim. Acta, 44, 3549 (1999) https://doi.org/10.1016/S0013-4686(99)00115-2
  17. N.Cui, J.L.Luo, Acta Mater., (in press)
  18. N.Cui, J.L.Luo, J. Alloys Compd., 231 397 (1995) https://doi.org/10.1016/0925-8388(95)01854-9
  19. Z.P.Li, S.Suda, The Electrochemical Society Proceedings, PV. 94-27 (1994) 78
  20. I.Barin : Themochemical Data of Pure Substances, VCH, New York (1989)
  21. F.J.Liu, S.Suda, J. Alloys Compd., 231 (1/2), 742 (1995) https://doi.org/10.1016/0925-8388(95)01711-9