A Two-dimensional Steady State Simulation Study on the Radio Frequency Inductively Coupled Argon Plasma

  • Lee, Ho-Jun (Department of Electrical Engineering, Pusan National University) ;
  • Kim, Dong-Hyun (Department of Electrical Engineering, Pusan National University) ;
  • Park, Chung-Hoo (Department of Electrical Engineering, Pusan National University)
  • Published : 2002.05.01

Abstract

Two-dimensional steady state simulations of planar type radio frequency inductively coupled plasma (RFICP) have been performed. The characteristics of RFICP were investigated in terms of power transfer efficiency, equivalent circuit analysis, spatial distribution of plasma density and electron temperature. Plasma density and electron temperature were determined from the equations of ambipolar diffusion and energy conservation. Joule heating, ionization, excitation and elastic collision loss were included as the source terms of the electron energy equation. The electromagnetic field was calculated from the vector potential formulation of ampere's law. The peak electron temperature decreases from about 4eV to 2eV as pressure increases from 5 mTorr to 100 mTorr. The peak density increases with increasing pressure. Electron temperatures at the center of the chamber are almost independent of input power and electron densities linearly increase with power level. The results agree well with theoretical analysis and experimental results. A single turn, edge feeding antenna configuration shows better density uniformity than a four-turn antenna system at relatively low pressure conditions. The thickness of the dielectric window should be minimized to reduce power loss. The equivalent resistance of the system increases with both power and pressure, which reflects the improvement of power transfer efficiency.

Keywords

References

  1. J. Givens, S Geissler, J. Lee, O. Cain, J Marks, P.Keswick and C. Cunningham ‘Selective Dry Etching in a High Density Plasma for 0.5um complementary MOS technology’ J. Vac. Sci. Technol. B 12(1) pp.427-432, Jan. 1994
  2. S.M. Rossnagel and J. Hopwood ‘Metal Ion Deposition from Ionized Magnetron Sputtering Discharge’, J. Vac. Sci. Technol. B 12(1) pp.449-453, Jan. 1994
  3. Ii-Dong Yang, Ho-Jun Lee, Ki-Woong Whang, 'A Study on the Characteristics of Planar Type Inductively Coupled Plasma and it's Applications on the Selective Oxide Etching', Journal of the Korean Vacuum Society, 6(1) pp.92-98, Feb. 1997
  4. J. Hopwood, C. R. Guarnieri, S. J. Whitehair, and J. J. Cuomo, 'Electromagnetic fields in a radio-frequency induction plasma‘, J. Vac. Sci. Technol. A11(1), pp.147-151, Jan. 1993
  5. J. Hopwood, C. R. Guarnieri, S. J. Whitehair, and J. J. Cuomo, 'Langmuir probe measurements of a radio frequency induction plasma', J. Vac. Sci. Technol. All(1), pp.152-156, Jan. 1993
  6. M.A. Lieberman and A. J. Lichtenberg, Principles of Plasma Discharges and Materials Processing: John Wiley & Sons pp387-410. 1994
  7. Peter L. G. Ventzek, Robert J. Hoekstra and Mark J. Kushner,'Two dimsensional modeling of high density inductively coupled sources for materials processing', J. Vac. Sci. Technol. B 12(1) pp.461-477, Jan. 1994
  8. R.A. Stewart, P. Vitello and D.B. Graves 'Two dimensional fluid model of high density inductively coupled plasma sources', J. Vac. Sci. Technol. B12(1) pp.478-485, Jan. 1994
  9. V.A.Godyak, R.B.Piejak and B.M. Alexandrovich 'Electrical characteristics and electron heating mechanism of an inductively coupled argon discharge', Plasma Sources Sci. Technol. 3, pp169-176, 1994
  10. Yu. M. Aliev, H. Schluter and A. Shivarova, Guided Wave-Produced Plasmas: Springer-Verlag, pp7-28, 2000
  11. A.D. Richards, B.E. Thompson, and Herbert H. Sawin, 'Continuum modeling of argon radio frequency glow discharges', Applied Phys. Lett. 50(9) pp.489-491, Mar. 1987
  12. Yuri P. Raizer, Gas Discharge Physics: Springer Verlag, pp8-34, 1991
  13. N.S.Yoon, S.S.Kim, C.S.Chang and D.K.Choi, 'One dimensional solution for Electron Heating in an Inductively Coupled Discharge', Phys. Rev. E, vol.54, no.1, pp757-768, 1997
  14. N.S.Yoon, S.M.Hwang and D.K.Choi, 'Two dimensional non-local heating theory of planar-type inductively coupled plasma discharge', Phys. Rev. E, vol.55, no.6, pp7536-7549, 1997
  15. COMSOL AB, 'FEMLAB Reference Manual Ver2.2', 2001
  16. Y.T. Kim, Y.S. Rho, H.S.Lee, and K.W. Whang 'A Study on the characteristics of Inductively Coupled Plasma by Numerical Simulation' Journal of the Korean Vacuum Society, 3(4) pp.457-465, Feb. 1994