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Electro-optical analysis of a miniaturized electrostatic electron lens

초소형 전자 렌즈의 전자 광학적 분석

  • Kim, Ho-Seob (Dept. of Physics and Advanced Material Science, and Center for Next Generation Semiconductor Technology, Sun Moon University) ;
  • Kim, Dae-Wook (Dept. of Physics and Advanced Material Science, and Center for Next Generation Semiconductor Technology, Sun Moon University) ;
  • Kim, Young-Chul (Dept. of Physics and Advanced Material Science, and Center for Next Generation Semiconductor Technology, Sun Moon University) ;
  • Choi, Sang-Kuk (ETRI) ;
  • Kim, Dae-Yong (ETRI)
  • Published : 2003.04.01

Abstract

The analysis of operation characteristics of a miniaturized electrostatic electron lens system called an Einzel lens was performed using a simulation tool of FCM method. The potential distributions of Einzel lenses operated both in retarding and accelerating modes show similar features. But the electric fields determined from the potential distributions show opposite directions, which results in different features in the electron beam trajectory in each mode of operation. For the same working distance, focusing voltage in the accelerating mode is higher than that in the retarding mode.

FCM(Fast moving least square reproducing kernel point collocation method) 방식의 simulation tool을 이용하여 전기장으로 구동되는 초소형 전자 렌즈의 구동 특성을 조사·분석하였다. Einzel 렌즈의 retarding mode와 accelerating mode구동에서 포텐셜 분포는 유사하지만, electric field strength는 서로 다른 방향을 갖게 되어 서로 다른 형태의 전자 궤적을 보인다. 동일한 working distance에서 accelerating mode로 구동되는 전자렌즈는 retarding mode로 구동되는 경우보다 매우 높은focusing 전압을 필요로 한다.

Keywords

References

  1. Miroslav Sedlacek, Electron Physics of Vacuum and Gaseous Devices (JOHN WILEY & SONS, INC., New York, USA, 1996), Chapter 4
  2. P. W. Hawkers and E. Kasper, Principles of Electron Optics (ACADEMIC PRESS, San Diego, USA, 1989), Vol. 1,2
  3. H. S. Kim, M. L. Yu, U. Staufer, L. P. Muray, D. P. Kern, and T. H. P. Chang, 'Oxygen processed field emission tips for microcolurnn applications,' J. Vac. Sci. Technol. B Vol. 11, no. 6, pp. 2327-2331,1993 https://doi.org/10.1116/1.586981
  4. M. L. Yu, B. W. Hussey, H. S. Kim, and T. H. P. Chang, 'Emission characteristics of ultrasharp cold field emitters,' J. Vac. Sci. Technol. B vol. 12, no. 6, pp. 3431-3435, 1994 https://doi.org/10.1116/1.587526
  5. E. Kratschmer, H. S. Kim, M. G. R. Thomson, K. Y. Lee, S. A. Rishton, M. L. Yu, and T. H. P. Chang, 'Sub-40 nm resolution 1 keV scanning tunneling microscope field-emission microcolumn,' J. Vac. Sci. Technol. B vol. 12, no. 6, pp. 3503-3507, 1994 https://doi.org/10.1116/1.587459
  6. E. Kratschrner, H. S. Kim, M. G. R. Thomson, K. Y. Lee, S. A. Rishton, M. L. Yu, and T. H. P. Chang, 'An electronbeam microcolumn with improved resolution, beam current, and stability,' J. Vac. Sci. Technol. B vol.,13, no. 6, pp. 2498-2503, 1995 https://doi.org/10.1116/1.588381
  7. D. W. Kim and Y. Kim, 'Point collocation methods using the fast moving least-square reproducing kernel approximation,' Int. J. Numer. Meth. Engng., vol. 56, pp. 1445-1464, 2003 https://doi.org/10.1002/nme.618

Cited by

  1. Research on the electron-beam characteristics according to the shape of electron lenses in low-energy microcolumn using Monte Carlo numerical analysis vol.9, pp.1, 2008, https://doi.org/10.5762/KAIS.2008.9.1.023