Analytical Expressions of Temperature Dependent Breakdown Voltage and On-Resistance for Si Power MOSFETs

실리콘 전력 MOSFET의 온도 관련 항복 전압과 ON 저항을 위한 해석적 표현

  • 정용성 (서라벌대학 디지털전기정보학부)
  • Published : 2003.05.01

Abstract

Analytical Expressions of temperature dependent breakdown voltage and on-resistance for silicon power MOSFETs are induced by employing the temperature dependent effective ionization coefficient extracted from temperature dependent ionization coefficients for electron and hole, and electron mobility in silicon. The analytical results for temperature dependent breakdown voltage are compared with experimental results for tile doping concentration, 4x10$^{14}$ cm$^{-3}$ , 1x10$^{15}$ cm$^{-3}$ , 6x10$^{16}$ cm$^{-3}$ respectively. The variations of temperature dependent on-resistance and breakdown voltage dependent ideal specific on-resistance are also compared with the ones reported previously. Good fits with the experimental results ate found for the breakdown voltages within 10% in error for the temperature in the range of 77~300K at each doping concentration.

전자와 정공의 온도 관련 이온화 계수로부터 추출한 온도 함수의 유효 이온화 계수 및 전자 이동도를 이용하여 실리콘 전력 MOSFET의 항복 전압과 on 저항을 위한 온도 함수의 해석적 표현식을 유도하였다. 온도 함수의 해석적 항복 전압 결과를 4x10/sup 14/ cm/sup -3/, 1x10/sup 15/ cm/sup -3/, 6x10/sup 16/ cm/sup -3/의 도핑 농도에 대해 각각 실험 결과와 비교하였고, 온도 및 항복 전압 함수의 on 저항 변화도 각각 실험 결과와 비교하였다. 각농도에 따른 온도 함수의 해석적 항복 전압은 77∼300k의 온도 범위에서 실험 결과와 10% 이내의 오차로 잘 일치하였다.

Keywords

References

  1. K. Shenai, 'Performance potential of low-voltage power MOSFET's in liquid-nitrogen-cooled power systems,' IEEE Trans. Electron Devices, vol. ED-38, no. 4, pp. 934-936, 1991 https://doi.org/10.1109/16.75228
  2. O. Mueller, in Low Temperature Power Conversion. University of Vermont, 1989
  3. C. Y. Ho, R. W. Powell, and P. E. Liley, J. Phys. Chem., Ref. Data 3, I-588, Table 144, 1974
  4. P. Mars, 'Temperature dependence of avalanche breakdown voltage in p-n junctions,' Int. J. Electronics, vol. 32, no. 1, pp. 23-37, 1971 https://doi.org/10.1080/00207217208938266
  5. B. J. Baliga, Modern Power Devices, Wiley, New York, 1987
  6. A. G. Chynoweth, 'Ionization rates for electron and holes in silicon,' Phys. Rev., vol. 109, pp. 1537-1539, 1958 https://doi.org/10.1103/PhysRev.109.1537
  7. R. V. Overstraeten and H. D. Man, 'Measurement of the ionization rates in diffused silicon p-n junctions,' Soild-St. Electron., vol. 13, pp. 583-608, 1970 https://doi.org/10.1016/0038-1101(70)90139-5
  8. S. M. Sze, Physics of Semiconductor Devices, Wiley, New York, 1987
  9. S. Selberherr, 'MOS device modeling at 77k,' IEEE Trans. Electron Devices, vol. 36, no. 8, pp. 1464-1474, 1989 https://doi.org/10.1109/16.30960
  10. W. Fulop, 'Calculation of avalanche breakdown voltages of silicon p-n junctions,' Solid-St. Electron., vol. 10, pp. 39-43, 1967 https://doi.org/10.1016/0038-1101(67)90111-6
  11. C. R. Crowell and S. M. Sze, 'Temperature dependence of avalanche multiplication in semiconductors,' Appl. Phys. Lett., vol. 9, pp. 242-244, 1966 https://doi.org/10.1063/1.1754731
  12. R. Singh and B. J. Baliga, 'Analysis and optimization of power MOSFETs for cryogenic operation,' Sloid-State Electronics, vol. 36, no. 8, pp. 1203-1211, 1993 https://doi.org/10.1016/0038-1101(93)90202-2
  13. C. Canali et al., 'Electron drift velocity in silicon,' Phys. Rev., vol. B12, pp. 265-2284, 1975 https://doi.org/10.1103/PhysRevB.12.2265
  14. T. Kimoto, T. Urushidani, S. Kobayashi, and H. Matsunami, 'High-voltage (>1kV) SiC Schottky barrier diodes with low on-resistances,' IEEE Electron Device Letters, vol. 14, no. 12, pp. 548-550, 1993 https://doi.org/10.1109/55.260785
  15. A. A. Jaecklin, Power Semiconductor Devices and Circuits, Plenum Press, New York, pp. 377-388, 1992
  16. C. Bulucea and R. Possen, 'Trench DMOS transistor technology for high-current(100A range) switching,' Solid-State Electronics, vol. 34, no. 5, pp. 493-507, 1991 https://doi.org/10.1016/0038-1101(91)90153-P
  17. T. Syau, P. Venkatraman, and B. J. Baliga, 'Comparison of ultra specific on-resistance UMOSFET structure:The ACCUFET, EXTFET, INVFET, and conventional UMOSFET's,' IEEE Transacions on Electron Devices, vol. 41, no. 5, pp. 800-808, 1994 https://doi.org/10.1109/16.285034
  18. S. Matsumoto, T. Ohno, and K. Izumi, 'Ultralow specific on resistance UMOSFET with trench contacts for source and body regions realized by selfaligned process,' Electron. Lett., vol. 27, pp. 1640-1642, 1991 https://doi.org/10.1049/el:19911025
  19. H. R. Chang, 'Numerical and experimental comparison of 60V vertical double-diffused MOSFETs and MOSFETs with a trench-gate structure,' Solid-State Electronics, vol. 32, pp. 247-251, 1989 https://doi.org/10.1016/0038-1101(89)90099-3
  20. Y. Baba, N. Matsuda, S. Yanagiya, S. Hiraki, and S. Yasuda, 'A study on a high blocking voltage UMOS-FET with a double gate structure,' pp. 300-302, in pric. 1992 Int. Symp. Power Semiconductor Device & Ics, Tokyo, 1992