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The Characteristics of 〈112〉-preferred Orientation for Photocatalytic TiO2 Fabricated by CVD

CVD법에 의해 제작된 광촉매 TiO2 〈112〉 우선배향의 특성

  • Kang, Kyoung-tae (Department of Materials Science & Engineering, Korea University) ;
  • Jhin, Jung-geun (Department of Materials Science & Engineering, Korea University) ;
  • Kang, Pil-kyu (Department of Materials Science & Engineering, Korea University) ;
  • Ro, Dae-ho (Department of Materials Science & Engineering, Korea University) ;
  • Byun, Dong-jin (Department of Materials Science & Engineering, Korea University)
  • Published : 2003.07.01

Abstract

The characteristics of <112> orientation were studied for the $TiO_2$thin films, which were prepared on the glass by CVD (chemical vapor deposition) at various substrate temperatures. It was confirmed that $TiO_2$ films exhibited <112>-preferred orientation in a specific temperature range. Although $TiO_2$polycrystalline film grown deposited at relatively low temperature showed the growth of random directions, the <112>-preferred orientation was gradually developed with increasing deposition temperature. According to exhibit higher degree of <112>-preferred orientation, $TiO_2$thin film showed porous surface morphology, well-developed columnar structure, and deeper voids resulted from non-aggregation of columns were observed. In addition, transmittance was enhanced. Therefore, the growth of $TiO_2$with <112>-preferred orientation is suitable for glass coating because of predominance of photocatalytic efficiency and transmittance.

Keywords

References

  1. H. Shibata, M. Murota, K. Hashimoto, Jpn. J. Appl. Phys., 32, 4479 (1993) https://doi.org/10.1143/JJAP.32.4479
  2. S. Veprek, Thin Solid Films, 130, 135 (1985) https://doi.org/10.1016/0040-6090(85)90303-7
  3. E. Hecht, Optics, Addison-Wesley, (1987)
  4. R. M. Alberici, W. F. Jardim, Appl. Catal. B: Environ., 14, 55 (1997) https://doi.org/10.1016/S0926-3373(97)00012-X
  5. D. Haneman, Surf. Sci., 86, 462 (1979) https://doi.org/10.1016/0039-6028(79)90424-2
  6. Y. Kikuchi, K. Sumada, T. Iyoda and K. Hashimoto, J. Photochem. Photobiol. A, 106, 51 (1997) https://doi.org/10.1016/S1010-6030(97)00038-5
  7. R. Wang, K. Hashimoto, A. Fujishima, M. Chikuni, E. Kojima, A.Kitamura, M. Shimohigoshi and T. Watanabe, Nature, 388, 431 (1997) https://doi.org/10.1038/41233
  8. R. Wang, K. Hashimoto, A. Fujishima, M. Chikuni, E. Kojima, A. Kitamura and M. Shimohigoshi, Adv. Mater., 10, 135 (1998) https://doi.org/10.1002/(SICI)1521-4095(199801)10:2<135::AID-ADMA135>3.0.CO;2-M
  9. D. Byun, Y. Jin, B. Kim, J. K. Lee and D. Park, J. of Hazardous Materials, 73, 199 (2000) https://doi.org/10.1016/S0304-3894(99)00179-X
  10. Y. Paz, A. Heller, Photooxidatively self-cleaning transparent titanium dioxide films on soda lime glass: The deleterious effect of sodium contamination and its prevention J. Mater. Res., 12, 2759 (1997) https://doi.org/10.1557/JMR.1997.0367
  11. B. Kim, D. Byun, J.-K.Lee and D. Park, Jpn. J. Appl. Phys., 41, 222 (2002) https://doi.org/10.1143/JJAP.41.222
  12. F. K. Lotgering, J. Inorg. Nucl. Chem., 9, 113 (1959) https://doi.org/10.1016/0022-1902(59)80070-1
  13. P. Hartman, Crystal Growth, North-Holland, Amsterdam, (1973)
  14. N. Tanaka, S. Ohshio and H. Saitoh, J. Ceram. Soc. Jpn., 105, 551 (1997) https://doi.org/10.2109/jcersj.105.551
  15. A.van der Drift, Philips Res. Rep., 22, 267 (1967)
  16. B.R. Weibberger, R.B. Garber, Appl. Phys. Lett., 66, 2409 (1995) https://doi.org/10.1063/1.113956
  17. L. J. Meng and M. P. Dos Santos, Thin Solid Films, 226, 22 (1993) https://doi.org/10.1016/0040-6090(93)90200-9