치과용 임플란트 주위 뼈모세포에 대한 전기자극의 영향에 관한 연구

The Effect of Electrical Stimulation on Osteoblast Surrounding Dental Implant

  • 우경엽 (경희대학교 치과대학 치과보철학교실) ;
  • 권긍록 (경희대학교 치과대학 치과보철학교실) ;
  • 최부병 (경희대학교 치과대학 치과보철학교실)
  • Woo, Kyung-Yeup (Department of Prosthodontics, Division of dentistry, Graduate school, Kyung hee University) ;
  • Kwon, Kung-Rock (Department of Prosthodontics, Division of dentistry, Graduate school, Kyung hee University) ;
  • Choi, Boo-Byung (Department of Prosthodontics, Division of dentistry, Graduate school, Kyung hee University)
  • 발행 : 2003.09.30

초록

Several factors can affect the formation of bone tissues surrounding implants. One of the factors is electrical stimulation. It is known to change the movement of cells, form and destroy cells, and alter concentration and chemical component of soft tissues and bones. The effect of electrical stimulation on bone formation can vary according to the intensity of electric currents, stimulating time, the method of sending electric currents, and tissues and cells currents are applied to. This study examines how various enviroments affect osteoblasts. (1) effect on osteoblast with varying intensity of currents Osteoblast-like cells were raised on four plates where implants can be placed. A constant current sink (MC3T3-E1) that can adjust the intensity and stimulating time of electric currents was used. The four plates were stimulated with $0{\mu}A$, $10{\mu}A$, $20{\mu}A$, and $40{\mu}A$, respectively. After 24 hours of stimulation, the number and distribution of cells surrounding implants were examined. (2) effect on osteoblast with varying conditions The 3 study was performed with same method. (1) The change of attached cell number 72-hour after application of various currents (2) The change of attached cell number 72-hour after application of various interval (3) The comparison of attached cell number by implant surface texture The following are the results: 1. The distribution and density of cells surrounding implant is highest under the intensity of electric currents of $20{\mu}A$. 2. The number of cells attached implants is highest under the intensity of electric currents of $20{\mu}A$. 3. The number of cells attached implants is highest under continous electric currents 4. The number of cells attached implants is not different by implant surface texture.

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