Athermalized Polymeric Arrayed-Waveguide Grating by Partial Detachment from a Si Substrate

  • Received : 2003.09.15
  • Published : 2004.06.30

Abstract

We demonstrate a new fabrication method for adjusting the temperature dependence of a polymeric arrayed-waveguide grating (AWG) on a Si substrate. A temperature-dependent wavelength shift of-0.1nm/$^{\circ}C$ in a polymeric AWG on a Si substrate is reduced of+0.1nm/$^{\circ}C$ by detaching part of the polymer film, including the grating channel region of the AWG, from the Si substrate while the other parts remain fixed on the substrate.

Keywords

References

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