DOI QR코드

DOI QR Code

Bias 전압에 따른 ZnO:Al 투명전도막의 전기적 특성

Substrate Bias Voltage Dependence of Electrical Properties for ZnO:Al Film by DC Magnetron Sputtering

  • 박강일 (경성대학교 전기전자공학과) ;
  • 김병섭 (경성대학교 전기전자공학) ;
  • 임동건 (충주대학교 전자공학) ;
  • 이수호 (경성대학교 전기전자공학) ;
  • 곽동주 (경성대학교 전기전자공학과)
  • 발행 : 2004.07.01

초록

Recently zinc oxide(ZnO) has emerged as one of the most promising transparent conducting films with a strong demand of low cost and high performance optoelectronic devices, ZnO film has many advantages such as high chemical and mechanical stabilities, and abundance in nature. In this paper, in order to obtain the excellent transparent conducting film with low resistivity and high optical transmittance for Plasma Display Pannel(PDP), aluminium doped zinc oxide films were deposited on Corning glass substrate by dc magnetron sputtering method. The effects of the discharge power and doping amounts of $Al_2$$O_3$ on the electrical and optical properties were investigated experimentally. Particularly in order to lower the electrical resistivity, positive and negative bias voltages were applied on the substrate, and the effect of bias voltage on the electrical properties of ZnO:Al thin film were also studied and discussed. Films with lowest resistivity of $4.3 \times 10 ^{-4} \Omega-cm$ and good transmittance of 91.46 % have been achieved for the films deposited at 1 mtorr, $400^{\circ}C$, 40 W, Al content of 2 wt% with a substrate bias of +30 V for about 800 nm in film thickness.

키워드

참고문헌

  1. 전기전재재료학회지 v.15 no.6 ZnO게 소자 연구 동향 황득규;방규현;명재민
  2. Materials Sceince and Engineering v.B.94 Characteristic of indium tin oxide films deposited by bias magnetron sputtering Ch.Sujatha;G.Mohan Rao;S.Uthanna https://doi.org/10.1016/S0921-5107(02)00090-9
  3. Solar Energy Material & Solar Cells v.65 Electrical and optical properties of ZnO thin film as a function of deposition parameters Woon Jo Jeong;Gye Choon Park
  4. 전기전재재료학회논문지 v.9 no.2 Rf magnetron sputtering 법으로 ZnO박막 제조시 기판온도에 따라 c축배향성에 관한 연구 이종덕;송준태
  5. 전기전재재료학회논문지 v.10 no.2 Magnetron sputtering 으로 증착한 ZnO박막의 특성과 열처리에 따른 비저항과 미세구조 이승환;성영권;김종관
  6. 전기전재재료학회논문지 v.9 no.6 Al₂O₃가 첨가된 ZnO의 전기적 특성 최우성;소병문;홍진웅
  7. Applied Surface Science v.169-170 Argon gas pressure dependence of the properties of transparent conducting ZnO:Al films deposited on glass substrates Yasuhiro Igasaki;Hirogazu Kunma
  8. 전기전재재료학회논문지 v.9 no.7 Al₂O₃가 미량 첨가된 비 선형성 ZnO 바리스어의 미세구조와 의 전도기구 한세원;강형부;김형식
  9. The 3rd international Conference on Advanced Materials and Devices Argon gas pressure and substrate temperature dependencies ZnO:Al film by dc magnetron sputtering D.J.Kwak;K.I.Park;B.S.Kim;S.J.Lee;D.G.Lim;S.H.Lee
  10. Thin Solid Films v.80 no.1 Fabrication and characterization of Indium Tin Oxide thin filns for Electroouminescent applications R.Tueta;M.Braguier https://doi.org/10.1016/0040-6090(81)90216-9
  11. Proceeding of the KIEEME(in Korean) Annual Autumn Conference 2003 v.4 no.1 Some properties of ZnO:Al trandparent conducting films by dc magnetron sputtering method K.I.Park;B.S.Kim;D.G.Lim;D.J.Kwak
  12. Proceeding of the KIEEME Annual Autumn Conference 2003 v.16 Effect of substrate bias on electrical properties of ZnO:Al transparent conducting film K.I.Park;B.S.Kim;D.G.Lim;S.H.Lee;D.J.Kwak
  13. Proceeding of 2003 Spring Conference of KIEEME Properties of ITO transparent conducting film by DC magnetron sputtering method K.I.Park;B.S.Kim;D.G.Lim;G.Y.Park;D.J.Kwak
  14. Glow Discharge Process-sputtering and Plasma Etching Brian Chapman
  15. Materials Sceince and Engineering v.B94 Characteristic of Indium Tin Oxide Films Deposited by bias Magnetron Sputtering Ch.Sujatha;G.Mohan Rao;S.Uthanna
  16. Thin Solid Films v.366 Bias voltage dependence of properties for depositing transparent conducting ITO films on flexible substrate Z.W.Yang;S.H.Han;T.L.Yang;Lina Ye;D.H.Zhang;C.F.Cheng https://doi.org/10.1016/S0040-6090(00)00919-6