Polymer(Korea) (폴리머)

The Polymer Society of Korea (한국고분자학회)
권호 표지

Fabrication Process of a Nano-precision Polydimethylsiloxane Replica using Vacuum Pressure-Difference Technique

진공 압력차이법에 의한 나노 정밀도를 가지는 폴리디메틸실록산 형상복제

  • 박상후 (한국과학기술원 기계공학과) ;
  • 임태우 (한국과학기술원 기계공학) ;
  • 양동열 (한국과학기술원 기계공학) ;
  • 공홍진 (한국과학기술원 물리학) ;
  • 이광섭 (한남대학교 고분자공학과)
  • Published : 2004.07.01
Download PDF
⟨ Previous Next ⟩

Abstract

A vacuum pressure-difference technique for making a nano-precision replica is investigated for various applications. Master patterns for replication were fabricated using a nano-replication printing (nRP) process. In the nRP process, any picture and pattern can be replicated from a bitmap figure file in the range of several micrometers with resolution of 200nm. A liquid-state monomer is solidified by two-photon absorption (TPA) induced by a femto-second laser according to a voxel matrix scanning. After polymerization, the remaining monomers were removed simply by using ethanol droplets. And then, a gold metal layer of about 30nm thickness was deposited on the fabricated master patterns prior to polydimethylsiloxane molding for preventing bonding between the master and the polydimethylsiloxane mold. A few gold particles attached on the polydimethylsiloxane stamp during detaching process were removed by a gold selecting etchant. After fabricating the polydimethylsiloxane mold, a nano-precision polydimethylsiloxane replica was reproduced. More precise replica was produced by the vacuum pressure-difference technique that is proposed in this paper. Through this study, direct patterning on a glass plate, replicating a polydimethylsiloxane mold, and reproducing polydimethylsiloxane replica are demonstrated with a vacuum pressure-difference technique for various micro/nano-applications.

본 연구는 나노 복화공정을 이용하여 마이크로 혹은 나노공정에 응용이 가능한 형상모형 제작공정 개발과 폴리디메틸실록산 (polydimethylsiloxane)를 이용하여 만들어진 형상모형의 몰드로 나노급 정밀도의 폴리디메틸실록산 형상을 복제하는 공정에 관한 것이다. 본 연구에서 제안한 나노 복화공정은 복잡한 형상모형 (pattern)이나 2차원 형상을 CAD 파일 없이 비트맵 그림파일을 이용하여 직접적으로 200nm 정밀도를 가지는 형상으로 만들 수 있다. 형상모형은 펨토초 레이저를 이용하여 이광자 흡수 중합법으로 제작하기 때문에 형상의 정밀도는 레이저 범의 회절한계 이하로 얻을 수 있다. 이렇게 제작된 마스터 형상모형은 본 연구에서 제안한 진공압력차이법으로 폴리디메틸실록산 몰드를 제작하여 기존의 제작방법에 비하여 정밀한 제작이 가능함을 보였으며 또한 제작된 몰드를 이용하여 양각의 플리디메틸실록산 스탬프를 제작하였다.

Keywords

References

  1. Nature v.417 S. Y. Chou;C. Keimel;J. Gu https://doi.org/10.1038/nature00792
  2. Appl. Phys. Lett. v.79 Y. S. Kim;K. Y. Suh;H. H. Lee https://doi.org/10.1063/1.1407859
  3. Angew. Chem. Int. Ed. v.37 Y. Xia;G. M. Whitesides https://doi.org/10.1002/(SICI)1521-3773(19980316)37:5<550::AID-ANIE550>3.0.CO;2-G
  4. Langmuir v.18 T. W. Odem;J. C. Love;D. B. Wolfe;K. E. Paul;G. M. Whitesides https://doi.org/10.1021/la020169l
  5. Nano Lett. v.3 J. Zaumseil;M. A. Meitl;J. W. P. Hsu;B. R. Acharya;K. W. Baldwin;Y. L. Loo;J. A. Rogers https://doi.org/10.1021/nl0344007
  6. Opt. Lett. v.22 S. Maruo;O. Nakamura;S. Kawata https://doi.org/10.1364/OL.22.000132
  7. J. Microelectromechanical Systems v.7 S. Maruo;S. Kawata https://doi.org/10.1109/84.735349
  8. Appl. Phys. Lett. v.79 H.-B. Sun;K. Takada;S. Kawata https://doi.org/10.1063/1.1418024
  9. Appl. Phys. Lett. v.78 P. Galajda;P. Ormos https://doi.org/10.1063/1.1339258
  10. Nature v.412 S. Kawata;H.-B. Sun;T. Tanaka;K. Takada https://doi.org/10.1038/35089130
  11. Opt. Lett. v.28 J. Serbin;A. Egbert;A. Ostendorf;B. N. Chichkov;R. Houbertz;G. domann;J. Schulz;C. Cronauer;L. Frohlich;M. Popall https://doi.org/10.1364/OL.28.000301
  12. Appl. Phys. Lett. v.74 H.-B. Sun;S. Matsuo;H. Misawa https://doi.org/10.1063/1.123367
  13. Apply. Phys. Lett. v.83 H.-B. Sun;M. Maeda;K. Takada;J. W. M. Chon;M. Gu;S. Kawata https://doi.org/10.1063/1.1598293
  14. Op. Lett. v.26 H.-B. Sun;Y. Xu;S. Juodkazism;K. Sun;M. Watanabe;S. Matsuo;H. Misawa;J. Nishii https://doi.org/10.1364/OL.26.000325
  15. Appl. Phys. Lett. v.83 K. Kaneko;H. B. Sun;X. M. Duan;S. Kawata https://doi.org/10.1063/1.1610253
  16. Appl. Phys. Lett. v.80 T. Tanaka;H.-B. Sun;S. Kawata https://doi.org/10.1063/1.1432450
  17. Appl. Phy. Lett. v.83 H.-B. Sun;K. Takada;M.-S. Kim;K.-S. Lee;S. Kawata https://doi.org/10.1063/1.1599968
  18. H.-K. Yang;K.-S. Lee
  19. Stereolithography and other RP&M Technologies P. F. Jacobs