분석과학 (Analytical Science and Technology)

  • 제17권6호
  • /
  • Pages.464-469
  • /
  • 2004
  • /
  • 1225-0163(pISSN)
  • /
  • 2288-8985(eISSN)
한국분석과학회 (The Korean Society of Analytical Sciences)
권호 표지

루테늄-쿠페론의 전기화학적 행동 및 응용

Electrochemical behavior and Application of Ruthenium-Cupferron Complex

  • 투고 : 2004.07.27
  • 심사 : 2004.10.08
  • 발행 : 2004.12.25
PDF 다운로드
⟨ 이전 논문 다음 논문 ⟩

초록

순환 전압전류법을 이용하여, 1 mM 인산염 완충용액에서 루테늄-쿠페론 착물의 전기화학적 행동을 살펴보았다. 루테늄 정량의 최적 조건은 1 mM 인산염 완충용액 (pH 6.0), 0.1 mM 쿠페론의 용액에서 주사속도는 100 mV/s 이었다. 이 조건에서 농도 변화에 따른 선형 주사 전압곡선의 환원 봉우리 전류변화를 이용하여 얻은 루테늄의 검출 한계 ($3{\sigma}$)는 $1.2{\times}10^{-7}M$ 이다.

Cyclic voltammetry was used for elucidating the electrochemical behavior of Ru-cupferron complex in 1 mM phosphate buffer. The optimal conditions of ruthenium were found to be 1 mM phosphate buffer solution (pH 6.0) containing 0.1 mM cupferron, scan rate of 100 mV/s. By using the plot on the reduction peak currents of linear scan voltammograms vs. ruthenium concentration, the detection limit ($3{\sigma}$) was $1.2{\times}10^{-7}M$.

키워드

참고문헌

  1. K.B. Yatsimirskii and L.P. Tikhonova, Talanta, 34(1), 69(1987).
  2. J. Jhiliang and Q. Chen-zhen, Electroanal., 5, 535(1993).
  3. (a) I.M. Kolthoff, P. Madar, Anal. Chem., 42, 1762(1970). (b) S.G. Mairanovskii, J. Electroanal. Chem., 34, 69(1963).
  4. H. Freiser and Z. Zhao, Anal. Chem., 58, 1498(1986).
  5. T.K. Hong, M.Z. Czae, C. Lee, Y.S. Kwon and M.J Hong, Bull. Korean Chem. Soc., 15, 1035(1994).
  6. M.Z. Czae, C. Lee, T.K. Hong, Y.S. Kwon and M.J Hong, J. Korean Chem. Soc., 39, 35(1995).
  7. M. El Guebely, Anal. Chim. Acta., 15, 580(1956).
  8. 김소진, 권영순, 가톨릭대학교 논문집, 2, 249(1995).
  9. M.Z. Czae, Y.S. Kwon and S.J. Kim, J. Korean Chem. Soc., 41, 246(1997).
  10. Y.S. Kwon, S.J. Kim and M.Z. Czae, Anal. Sci. and Tech., 10, 114(1997).
  11. J. Wang, M.Z. Czae, J. Lu and M. Vuki, Microchem. J., 62, 121(1999).
  12. C. Leon, H. Emos, P. Ostapczuk and K. Hoppstock, Anal. Chim. Acta., 99, 356(1999).
  13. K. B. Yatsimirskii and L. P. Tikhonova, Talanta, 34(1), 69-75(1987).
  14. J. Jhiliang and Q. Chen-zhen, Electroanalysis, 5, 535-537(1993).
  15. E. Wang and W.Sung, Acta Chimica.Sinica., 31(5), 384(1965).
  16. J. Hojman, A, Stefabivic and B. Stankovic, J. Electronal. Chem., 30, 469-480(1971).
  17. J. P. Buckley, Anal. Chim. Acta, 52, 379-381(1970).
  18. E. Wang and W.Sung, Scientia Sinica, 15(5), 645-655(1996).
  19. R. Palaniappan and T.A. Kumar, Analyst, 118, 293-296(1993).
  20. K. Jiao, W. Jin and H. Metzner, Anal. Chim. Acta., 260, 35(1992).
  21. J. Wang, J. Lu and R. Setiadju, Talanta, 40, 351(1993).
  22. J. Wang, J. Lu and K. Olsen, Analyst, 117, 1913(1992).
  23. J. Wang and Setiadju, Anal. Chim. Acta., 264, 205(1992).
  24. J. Wang, J. Lu, D. Luo, Jianyan Wang and B. Tian, Electroanal., 9, 1247(1997).
  25. J. Wang, J. Lu and R. Setiadju, Electroanal., 5, 319(1993).
  26. Y. Baoxian and Y. Shuxun, Talanta, 41, 537(1994).
  27. K. Jiao, W. Jim and H. Metzner, Anal. Chim. Acta., 260, 35(1992).
  28. Y.S. Kwon, M.Y. Chong, Anal. Sci. and Tech., 16(3), 198(2003).
  29. I.M. Kolthoff and A. Liberti, J. Am. Chem. Soc., 70, 1885(1948).
  30. S.I. Ginzburg, N.A. Ezerskaya, I.V. Prokof'va, N.V. Fedorenko, V.I. Shlenskaya, N.K. Bel'skii, Analytical Chemistry of Platinum metals; Wiley, New York, 1975.